Heavily carbon-doped p-type InGaAs grown by gas source molecular beam epitaxy for application to heterojunction bipolar transistors

2007 ◽  
Vol 301-302 ◽  
pp. 212-216 ◽  
Author(s):  
Anhuai Xu ◽  
Ming Qi ◽  
Fuying Zhu ◽  
Hao Sun ◽  
Likun Ai
1992 ◽  
Vol 13 (5) ◽  
pp. 247-249 ◽  
Author(s):  
R.C. Gee ◽  
T.-P. Chin ◽  
C.W. Tu ◽  
P.M. Asbeck ◽  
C.L. Lin ◽  
...  

1992 ◽  
Vol 282 ◽  
Author(s):  
F. Ren ◽  
C. R. Abernathy ◽  
S. J. Pearton ◽  
P. W. Wisk ◽  
R. Esagui

Carbon-doped base InGaP/GaAs single and double heterojunction bipolar transistors (HBTs) grown by gas-source Metal Organic Molecular Beam Epitaxy (MOMBE) are reported. Large are devices (emitter diameter 70 μm) exhibited gain of 25 for high injection levels at a base doping of 5 × 1019 cm−3. Ideality factors (<1.1)were obtained for both emitter-base and base-collector junctions in both single (SHBT) and double PHBT) heterojunction devices. Vceo's of 12 V and 19 V for SHBTs and DHBTs respectively were measured.


1995 ◽  
Vol 150 ◽  
pp. 221-226
Author(s):  
T. Tomioka ◽  
N. Okamoto ◽  
H. Ando ◽  
S. Yamaura ◽  
T. Fujii

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