scholarly journals Effect of duty cycle and treatment time on electrolytic plasma oxidation of commercially pure Al samples

2019 ◽  
Vol 8 (2) ◽  
pp. 2141-2147
Author(s):  
Matheus de M. Tavares ◽  
Jussier de O. Vitoriano ◽  
Ruthilene C.L. da Silva ◽  
Adonias R. Franco ◽  
Gelson B. de Souza ◽  
...  
Keyword(s):  
Duty Cycle ◽  
Treatment Time ◽  
Plasma Oxidation ◽  
Commercially Pure ◽  
Electrolytic Plasma Oxidation

Corrosion Properties of Plasma Oxidized Titanium Nitride for Biomedical Applications

2015 ◽  
Vol 227 ◽  
pp. 471-474 ◽  
Author(s):  
Jerzy Robert Sobiecki ◽  
Agnieszka Brojanowska ◽  
Konrad Kowalczyk
Keyword(s):  
Titanium Nitride ◽  
Calcium Ions ◽  
Biomedical Applications ◽  
Oxidation Potential ◽  
Plasma Oxidation ◽  
Corrosion Properties ◽  
Oxide Layers ◽  
Oxidation Processes ◽  
Oxidation Potentials ◽  
Electrolytic Plasma Oxidation

The article compares the corrosion properties of oxide layers formed on titanium nitride (obtained in glow-discharge nitriding) using electrolytic plasma oxidation. The corrosion properties are analysed in correlation with the surface morphology, microstructure and chemical composition of the layers. The oxidation processes were carried out in 10% and 25% phosphoric acid (V) solutions containing Ca2+ calcium ions. In each of these environments, oxide layers were formed using three oxidation potentials: 200V, 400V and 600 V. The oxidation potential and the concentration of acid and calcium ions in the oxidation solution was shown to affect the morphology of the surface and the corrosion properties of the oxide layers obtained.

scholarly journals Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation

2019 ◽  
Vol 13 (4) ◽  
pp. 365-373 ◽  
Author(s):  
F. Hajakbari ◽  
S. Rashvand ◽  
A. Hojabri
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Treatment Time ◽  
Plasma Power ◽  
Plasma Oxidation ◽  
Nanocrystalline Nickel ◽  
Step Method ◽  
Nickel Films ◽  
Quartz Substrates ◽  
Oxidation Parameters

Abstract Nanocrystalline nickel oxide (NiO) thin films were successfully grown on quartz substrates by two-step method. In the first step, nickel films were deposited on quartz substrates by DC magnetron sputtering technique. Then, the plasma oxidation of nickel films was used for preparation of nickel oxide. The effect of DC plasma power and treatment time on the structural, morphological and optical properties of the NiO films were investigated by different analyses. XRD results indicated that the plasma powers effectively influenced the structure of films, and the best crystallinity was obtained for plasma power of 15 w and treatment time of 20 min. The XPS, RBS and EDS analysis confirmed the presence of Ni and O elements. The FESEM and AFM images showed a granular structure with spherical shapes of grains. The optical band gap of the films synthesized under different plasma oxidation conditions was also discussed.

STUDY OF PULSE ON PULSED NANOCRYSTALLINE PLASMA ELECTROLYTIC CARBONITRIDING ON THE NANOSTRUCTURE OF COMPOUND LAYER

2008 ◽  
Vol 15 (04) ◽  
pp. 427-434 ◽  
Author(s):  
MAHMOOD ALIOFKHAZRAEI ◽  
SHAHROKH AHANGARANI ◽  
ALIREZA SABOUR ROUHAGHDAM
Keyword(s):  
Surface Hardening ◽  
Treatment Time ◽  
Pure Titanium ◽  
Compound Layer ◽  
Commercially Pure Titanium ◽  
Optimum Size ◽  
Process Variables ◽  
Commercially Pure ◽  
Cooling Bath ◽  
Plasma Electrolytic

Surface hardening of commercially pure titanium by using pulse on pulsed nanocrystalline plasma electrolytic carbonitriding has been studied in this investigation. Coating process has been performed on Triethanolamine-based electrolyte by cooling bath. Nanostructure of obtained compound layer was examined with figure analysis of SEM nanographs. The effects of process variables, i.e., Triethanolamine concentration, electrical conductivity of electrolyte, applied voltage, and treatment time, have been experimentally studied. Statistical methods were used to achieve the optimum size of nanocrystals. Finally the contribution percentage of effective factors of pulsed current was revealed and confirmation run show the validity of obtained results.

Effect of duty cycle on crystallinity and nanopore formation on anodized commercially pure titanium

2013 ◽  
Vol 29 ◽  
pp. e30
Author(s):  
R.S. Williamson ◽  
J. Disegi ◽  
J.A. Griggs ◽  
M.D. Roach
Keyword(s):  
Duty Cycle ◽  
Pure Titanium ◽  
Commercially Pure Titanium ◽  
Commercially Pure

scholarly journals Properties of atmospheric pressure plasma oxidized layers on silicon wafers

2014 ◽  
Vol 13 (1) ◽  
Author(s):  
Dana Skácelová ◽  
Petr Sládek ◽  
Pavel Sťahel ◽  
Lukáš Pawera ◽  
Martin Haničinec ◽  
...  
Keyword(s):  
Crystallographic Orientation ◽  
Atmospheric Pressure ◽  
Treatment Time ◽  
Crystalline Silicon ◽  
Atmospheric Pressure Plasma ◽  
Ambient Air ◽  
Surface Barrier ◽  
Plasma Oxidation ◽  
Plasma Parameters ◽  
Surface Barrier Discharge

AbstractIn this research a new process of plasma oxidation of crystalline silicon at room temperature is studied. The plasma oxidation was carried out using Diffuse Coplanar Surface Barrier Discharge (DCSBD) operating in ambient air and oxygen at atmospheric pressure. The influence of exposition time, plasma parameters and crystallographic orientation of silicon on oxidized layers and their dielectric properties were investigated. Thickness, structure and morphology of these layers were studied by ellipsometry, infrared absorption spectroscopy and scanning electron microscopy. During the treatment time, from 1 to 30 minutes, oxidized layers were obtained with thickness from 1 to 10 nm. Their roughness depends on the crystallographic orientation of silicon surface and exposure time. Electrical parameters of the prepared layers indicate the presence of an intermediate layer between silicon substrate and the oxidized layer.

INFLUENCE OF ELECTROLYTIC PLASMA OXIDATION COATING ON TENSILE BEHAVIOR OF DIE-CAST AM50 ALLOY SUBJECTED TO SALT CORROSION

2009 ◽  
Vol 23 (06n07) ◽  
pp. 960-965 ◽  
Author(s):  
LIHONG HAN ◽  
XUEYUAN NIE ◽  
PENG ZHANG ◽  
QIANG ZHANG ◽  
HENRY HU
Keyword(s):  
Mixed Layer ◽  
Ceramic Coatings ◽  
Ductile Deformation ◽  
Plasma Oxidation ◽  
Micro Cracks ◽  
Immersion Corrosion ◽  
Die Cast ◽  
Am50 Alloy ◽  
Electrolytic Plasma Oxidation ◽  
Fractured Surface

Three different thickness ceramic coatings were deposited on die-cast AM50 magnesium alloy in KOH and NaAlO 2 solution using electrolytic plasma oxidation (EPO) technology for corrosion prevention. Immersion corrosion tests were carried out in 3.5% NaCl solution for 336 hours to investigate the effect of coating thicknesses on tensile and fracture behaviors of the coated AM50 alloys. The results show that the yield strength (YS) and ultimate tensile strength (UTS) of the coated AM50 alloy subjected to immersion corrosion increase with an increase in coating thicknesses. Further analyses on stress and strain curves indicate that the coating enhances the strain-hardening rates of the corroded alloy during its plastic deformation. SEM examination on the fractured surface manifests that the substrate AM50 alloys exhibit characteristics of ductile deformation with deep dimples. However, brittle features prevail on the fractured surface of the mixed layer of coating plus oxidation corrosion product. Micro cracks were observed between the mixed layer and the AM50 alloy substrate induced by corrosion and within the mixed layer induced by EPO process, which could be responsible for the brittle fracture.

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