Challenges in measuring the quality of alcohol treatment

2012 ◽  
Vol 43 (3) ◽  
pp. e22
Author(s):  
Carrie Farmer, Ph.D.
Keyword(s):  
Alcohol Treatment

scholarly journals Disparities in the Use and Quality of Alcohol Treatment Services and Some Proposed Solutions to Narrow the Gap

2014 ◽  
Vol 65 (5) ◽  
pp. 626-633 ◽  
Author(s):  
Nina Mulia ◽  
Tammy W. Tam ◽  
Laura A. Schmidt
Keyword(s):  
Alcohol Treatment ◽  
Treatment Services

scholarly journals Alcohol Treatment Effects on Secondary Nondrinking Outcomes and Quality of Life: The COMBINE Study

2009 ◽  
Vol 70 (2) ◽  
pp. 186-197 ◽  
Author(s):  
Joseph S. LoCastro ◽  
Marston Youngblood ◽  
Ron A. Cisler ◽  
Margaret E. Mattson ◽  
Allen Zweben ◽  
...  
Keyword(s):  
Quality Of Life ◽  
Treatment Effects ◽  
Alcohol Treatment ◽  
Combine Study

scholarly journals Baseline health status and quality of life after alcohol treatment for women with alcohol dependence

2017 ◽  
Vol 64 ◽  
pp. 35-41 ◽  
Author(s):  
Krysten W. Bold ◽  
Elizabeth E. Epstein ◽  
Barbara S. McCrady
Keyword(s):  
Quality Of Life ◽  
Health Status ◽  
Alcohol Dependence ◽  
Alcohol Treatment ◽  
Baseline Health ◽  
Baseline Health Status

Methodological characteristics and quality of alcohol treatment outcome studies, 1970-98: an expanded evaluation

Addiction ◽  
2002 ◽  
Vol 97 (3) ◽  
pp. 253-263 ◽  
Author(s):  
Anne Moyer ◽  
John W. Finney ◽  
Carolyn E. Swearingen
Keyword(s):  
Treatment Outcome ◽  
Alcohol Treatment ◽  
Outcome Studies

Immunoferritin localization of intracellular antigens in positively stained frozen sections

1978 ◽  
Vol 36 (2) ◽  
pp. 168-169
Author(s):  
K. T. Tokuyasu
Keyword(s):  
Surface Tension ◽  
Water Surface ◽  
Thin Layers ◽  
The Other ◽  
Positive Staining ◽  
Frozen Sections ◽  
The Past ◽  
Ultrathin Frozen Sections ◽  
Definition Of

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Convergent Beam Electron Diffraction

1978 ◽  
Vol 36 (3) ◽  
pp. 304-315
Author(s):  
G. Lehmpfuhl
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Crystal Surface ◽  
Diffraction Spot ◽  
Crystal Thickness ◽  
Large Area ◽  
Electron Microscopic ◽  
Additional Information ◽  
Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

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