The critical role of substrate bias for the sputter deposition of molybdenum thin films

Cr thin films are often used as underlayers for Co alloy magnetic thin films, such as Co1, CoNi2, and CoNiCr3, for high density longitudinal magnetic recording. It is belived that the role of the Cr underlayer is to control the growth and texture of the Co alloy magnetic thin films, and, then, to increase the in plane coercivity of the films. Although many epitaxial relationship between the Cr underlayer and the magnetic films, such as ﹛1010﹜Co/ {110﹜Cr4, ﹛2110﹜Co/ ﹛001﹜Cr5, ﹛0002﹜Co/﹛110﹜Cr6, have been suggested and appear to be related to the Cr thickness, the texture of the Cr underlayer itself is still not understood very well. In this study, the texture of a 2000 Å thick Cr underlayer on Nip/Al substrate for thin films of (Co75Ni25)1-xTix dc-sputtered with - 200 V substrate bias is investigated by electron microscopy.

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Critical role of {002} preferred orientation on electronic band structure of electrodeposited monoclinic WO3 thin films

Sustainable Energy & Fuels ◽

10.1039/c8se00239h ◽

2018 ◽

Vol 2 (10) ◽

pp. 2224-2236 ◽

Cited By ~ 8

Author(s):

Wai Ling Kwong ◽

Pramod Koshy ◽

Judy N. Hart ◽

Wanqiang Xu ◽

Charles C. Sorrell

Keyword(s):

Thin Films ◽

Band Structure ◽

Oxygen Vacancies ◽

Electronic Band Structure ◽

Critical Role ◽

Preferred Orientation ◽

Electronic Band ◽

Wo3 Thin Films

Decoupled effects of crystallographic {002} orientation and oxygen vacancies on the electronic band structure of monoclinic WO3 films.

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Continuous and highly ordered organic semiconductor thin films via dip-coating: the critical role of meniscus angle

Science China Materials ◽

10.1007/s40843-020-1297-7 ◽

2020 ◽

Vol 63 (7) ◽

pp. 1257-1264

Author(s):

Xuanyu Liu ◽

Yu Zhang ◽

Xiaotao Zhang ◽

Rongjin Li ◽

Wenping Hu

Keyword(s):

Thin Films ◽

Organic Semiconductor ◽

Critical Role ◽

Dip Coating ◽

Semiconductor Thin Films

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Effects of applied substrate bias during reactive sputter deposition of nanocomposite tantalum carbide/amorphous hydrocarbon thin films

Thin Solid Films ◽

10.1016/j.tsf.2006.12.034 ◽

2007 ◽

Vol 515 (13) ◽

pp. 5403-5410 ◽

Cited By ~ 7

Author(s):

R.D. Evans ◽

G.L. Doll ◽

W.J. Meng ◽

F. Mei ◽

J.T. Glass

Keyword(s):

Thin Films ◽

Sputter Deposition ◽

Tantalum Carbide ◽

Substrate Bias ◽

Reactive Sputter Deposition

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Epitaxial (001) BiFeO3 thin-films with excellent ferroelectric properties by chemical solution deposition-the role of gelation

Journal of Materials Chemistry C ◽

10.1039/c4tc02371d ◽

2015 ◽

Vol 3 (3) ◽

pp. 582-595 ◽

Cited By ~ 29

Author(s):

Qi Zhang ◽

Nagarajan Valanoor ◽

Owen Standard

Keyword(s):

Thin Films ◽

Chemical Solution Deposition ◽

Room Temperature ◽

Ferroelectric Properties ◽

Critical Role ◽

Chemical Solution ◽

Solution Deposition ◽

Bifeo3 Thin Films

The critical role of gelation is demonstrated in order to achieve epitaxial (001)-BFO thin films with robust room-temperature ferroelectric properties.

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Preferred Crystal Orientation and its Effect on the Magnetization Reversal Property of CoCrTa Thin Films

MRS Proceedings ◽

10.1557/proc-403-707 ◽

1995 ◽

Vol 403 ◽

Cited By ~ 1

Author(s):

T. Yeh ◽

G. Wang ◽

J. C. Lin ◽

J. M. Sivertsen

Keyword(s):

Thin Films ◽

Magnetization Reversal ◽

Crystal Orientation ◽

Orientation Distribution ◽

Sputter Deposition ◽

Tantalum Nitride ◽

Substrate Bias ◽

Oriented Films ◽

Orientation Distributions ◽

The Relationship

AbstractCoCrTa thin films with c-axis predominatly oriented perpendicular to the plane of the film were obtained by sputter deposition on thin tantalum nitride underlayers with −75 volts substrate bias applied during the deposition of the film. The relationship between the distribution of c-axes preferred crystal orientation and magnetization reversal properties of the sputtered CoCrTa films was investigated. Higher coercivities are obtained for CoCrTa films having a more random crystal orientation distribution of hcp c-axes in polycrystal films, while lower coercivity is obtained for the highly oriented films. Such behavior may be attributed to the form of the induced local energy fluctuations associated with the crystal orientation distributions.

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