Effects of thermal treatment on structure, surface microstructure and optical properties of nitrogen-ion irradiated nanoparticle thin films

In this study, we report on the structural parameters and texture development which occurred during deposition and annealing of PbS films and their effect on optical properties. The films under study were deposited on glass substrates through chemical bath method. The reactive substances used to obtain the PbS layers were lead accetae trihydrated, thiourea and hydrazine hydrate. The films were prepared with one molar bath concentration and for various deposition times. The data showed that as-prepared and annealed thin films are polycrystalline with cubic structure and predominantly textured along 100. Results showed that thinner films are more prone to post deposition heat treatments as compared to thicker ones. Deposition parameters and thermal treatment strongly influence the optical properties of PbS films.

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Structural and optical properties of low energy nitrogen ion implanted SrTiO3 thin films

10.1063/1.4982124 ◽

2017 ◽

Cited By ~ 2

Author(s):

Vishnu Kumar ◽

K. Asokan ◽

S. Annapoorni

Keyword(s):

Thin Films ◽

Optical Properties ◽

Low Energy ◽

Structural And Optical Properties ◽

Nitrogen Ion ◽

Ion Implanted

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Influence of thermal treatment on the microstructure and electrical and optical properties of SnS thin films

Physics of the Solid State ◽

10.1134/s1063783414070038 ◽

2014 ◽

Vol 56 (7) ◽

pp. 1310-1314 ◽

Cited By ~ 4

Author(s):

S. A. Bashkirov ◽

P. P. Gladyshev ◽

V. F. Gremenok ◽

V. A. Ivanov

Keyword(s):

Thin Films ◽

Optical Properties ◽

Thermal Treatment ◽

Electrical And Optical Properties ◽

Sns Thin Films

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Preparation of Aluminum Nitride and Oxynitride Thin Films by Ion-Assisted Deposition

MRS Proceedings ◽

10.1557/proc-93-311 ◽

1987 ◽

Vol 93 ◽

Cited By ~ 10

Author(s):

J. D. Targove ◽

L J. Lingg ◽

J. P. Lehan ◽

C. K. Hwangbo ◽

H. A. Macleod ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Electron Beam ◽

Aluminum Nitride ◽

Oxygen Diffusion ◽

Vacuum Chamber ◽

Rutherford Backscattering Spectrometry ◽

Ion Fluxes ◽

Aluminum Oxynitride ◽

Nitrogen Ion

ABSTRACTAluminum nitride thin films have been deposited by ion-assisted deposition. Aluminum was electron-beam evaporated onto substrates with simultaneous nitrogen ion bombardment. Rutherford backscattering spectrometry showed that nitrogen-to-aluminum ratios of one or greater could be achieved with sufficient nitrogen ion fluxes. This excess nitrogen apparently degrades the optical properties of the films in the visible. Annealing at 500°C improves the optical properties drastically at the expense of a slight oxygen diffusion into the films. Finally, aluminum oxynitride films were deposited by adding an oxygen backfill to the vacuum chamber during deposition. These films had very similar optical properties to the annealed nitride films.

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Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique

Materials Science-Poland ◽

10.2478/msp-2019-0082 ◽

2020 ◽

Vol 38 (1) ◽

pp. 1-7

Author(s):

Zhaoyong Wang ◽

Weifen Jiang ◽

Yifan Lu ◽

Xinlian Wang ◽

Xiaoya Huang ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Optical Band Gap ◽

Anatase Phase ◽

Tio2 Thin Films ◽

Energy Filtering ◽

Deposition Parameters ◽

Direct Current Magnetron Sputtering ◽

Structure Surface

AbstractTiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS) technique. The influence of the filtering electrode mesh number on the structure and optical properties of TiO2 thin films was investigated. The structure, surface morphology and optical properties were characterized by XRD, SEM and ellipsometric spectroscopy, respectively. Results show that the TiO2 thin films deposited by the DMS and EFMS techniques at the same deposition parameters are composed of the anatase phase exclusively. TiO2 thin films deposited at lower deposition rate by the EFMS technique have lower crystallinity, smaller particle size and smoother surface. With increasing the mesh number, the refractive index, extinction coefficient and optical band gap are larger.

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