Influence of post-deposition annealing temperature on morphological, mechanical and electrochemical properties of CrN/CrAlN multilayer coating deposited by cathodic arc evaporation- physical vapor deposition process

Author(s):  
Yemurai Vengesa ◽  
Arash Fattah-alhosseini ◽  
Hassan Elmkhah ◽  
Omid Imantalab
2020 ◽  
Vol 329 ◽  
pp. 02029
Author(s):  
Anna Kameneva ◽  
Vadim Karmanov ◽  
Sergey Stepanov ◽  
Darya Kameneva

In this paper, TiN, ZrN, TixZr1-xN, Ti1-xAlxN coatings were obtained by cathodic arc evaporation at optimal technological parameters. The corrosion properties of these coatings were investigated in 5% NaOH. The coating ZrN deposited by cathodic arc evaporation slows down the corrosion in the 5% NaOH by over 3,000 times, and the passive current – by 2,000 times. The TixZr1-xN coating has the best physico-mechanical properties: microhardness Н = 36 GPa, Young’s modulus Е = 312 GPa, elastic recovery We = 78 %, resistance to elastic failure strain H/E = 0.12, and resistance to plastic strain H3/E2 = 1.31 GPa. The Ti1-xAlxN coating has the best wear properties: friction coefficient 0.09, counterbody wear intensity by volume 0.43•10-8 mm3/Nm, coating wear intensity by volume 0.05•10-4 mm3/Nm and by mass•0.03•10-5 mg/Nm. Multilayer coating TiN-TixZr1-xN-Ti1-xAlxN-ZrN (ZrN-top layer) has a complex of high physico-mechanical and wear properties in 5% NaOH.


Author(s):  
A. N. Sheveyko ◽  
K. A. Kuptsov ◽  
Ph. V. Kiryukhantsev-Korneev ◽  
E. A. Levashov ◽  
D. V. Shtansky

The novel technology of multilayer coating deposition combining electric-spark alloying (ESA), pulsed arc evaporation (PAE), and magnetron sputtering (MS) in one vacuum process is presented. Layers can be deposited using a single electrode material at operating pressures from 0,1 Pa to atmospheric pressure. The lower ESA layer provides increased substrate toughness, perfect adhesion and a relatively high (up to 100 μm) coating thickness. The upper PAE or MS layer up to 10 μm in thickness provides high mechanical and tribological characteristics. The technology of double-layer PAE–ESA and MS–ESA coating deposition was tested on substrates made of structural and tool steels, titanium alloys using electrodes of cemented carbides (WC–Co, TiCNiAl) and carbon (low-porous graphite).


2016 ◽  
Vol 368 ◽  
pp. 77-81
Author(s):  
Miroslav Béger ◽  
Jozef Sondor ◽  
Martin Sahul ◽  
Paulína Zacková ◽  
Marián Haršáni ◽  
...  

The article deals with the influence of different deposition parameters on the selected properties of AlCrN/Si3N4 nanocomposite coatings. Bias voltage, cathodes currents and working gas pressure were changed during the deposition process. All coatings were deposited using Lateral Rotating Cathodes (LARC®) process that belongs to the group of cathodic arc evaporation PVD technologies. In comparison with the typical cathodic arc evaporation process which usually uses planar targets the LARC® process utilizes rotational cathodes that are positioned close to each other. Nanohardness, Young's modulus, thickness and residual stresses were determinated in order to evaluate the influence of deposition parameters on these coatings properties


2006 ◽  
Vol 118 ◽  
pp. 323-327 ◽  
Author(s):  
Yin Yu Chang ◽  
Da Yung Wang ◽  
Chi Yung Hung

TiAlN, and TiAlN/CrN nanolayered coatings were synthesized by cathodic-arc evaporation with plasma enhanced duct equipment. Chromium and TiAl (50/50 at %) alloy cathodes were used for the deposition of TiAlN/CrN coatings. The effects of bilayer thickness and chromium content on the microstructure and mechanical properties of TiAlN/CrN nanolayered coatings were studied. The preferred orientation was changed from (200) in TiAlN monolayered coatings to (111) plane in the multilayered TiAlN/CrN coatings. The multilayered TiAlN/CrN coating with periodic thickness of 20 nm and the smallest crystallite size of 28 nm exhibited the highest hardness of 39 GPa. The multilayered TiAlN/CrN coatings also showed the best adhesion strength using scratch tests. It has been found that the structural and mechanical properties of the films were correlated with the addition of chromium and nanolayer thickness.


2005 ◽  
Vol 12 (04) ◽  
pp. 631-643 ◽  
Author(s):  
ALI MUBARAK ◽  
ESAH BINTI HAMZAH ◽  
MOHD RADZI HJ. MOHD TOFF ◽  
ABDUL HAKIM BIN HASHIM

Cathodic arc evaporation (CAE) is a widely-used technique for generating highly ionized plasma from which hard and wear resistant physical vapor deposition (PVD) coatings can be deposited. A major drawback of this technique is the emission of micrometer-sized droplets of cathode material from the arc spot, which are commonly referred to as "macroparticles." In present study, titanium nitride ( TiN ) coatings on high-speed steel (HSS) coupons were produced with a cathodic arc evaporation technique. We studied and discussed the effect of various nitrogen gas flow rates on microstructural and mechanical properties of TiN -coated HSS coupons. The coating properties investigated in this work included the surface morphology, thickness of deposited coating, adhesion between the coating and substrate, coating composition, coating crystallography, hardness and surface characterization using a field emission scanning electron microscope (FE-SEM) with energy dispersive X-ray (EDX), X-ray diffraction (XRD) with glazing incidence angle (GIA) technique, scratch tester, hardness testing machine, surface roughness tester, and atomic force microscope (AFM). An increase in the nitrogen gas flow rate showed decrease in the formation of macro-droplets in CAE PVD technique. During XRD-GIA studies, it was observed that by increasing the nitrogen gas flow rate, the main peak [1,1,1] shifted toward the lower angular position. Surface roughness decreased with an increase in nitrogen gas flow rate but was higher than the uncoated polished sample. Microhardness of TiN -coated HSS coupons showed more than two times increase in hardness than the uncoated one. Scratch tester results showed good adhesion between the coating material and substrate. Considerable improvement in the properties of TiN -deposited thin films was achieved by the strict control of all operational steps.


2011 ◽  
Vol 205 (21-22) ◽  
pp. 5116-5123 ◽  
Author(s):  
David Rafaja ◽  
Conrad Polzer ◽  
Gerhard Schreiber ◽  
Peter Polcik ◽  
Martin Kathrein

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