A TCAD simulation study of impact of strain engineering on nanoscale strained Si NMOSFETs with a silicon–carbon alloy stressor

2009 ◽  
Vol 518 (5) ◽  
pp. 1595-1598 ◽  
Author(s):  
Shu-Tong Chang ◽  
Wei-Ching Wang ◽  
Chang-Chun Lee ◽  
Jacky Huang
2011 ◽  
Vol 27 (1) ◽  
pp. 339-348 ◽  
Author(s):  
Kong Boon Yeap ◽  
Ehrenfried Zschech ◽  
Ude D. Hangen ◽  
Thomas Wyrobek ◽  
Lay Wai Kong ◽  
...  

Abstract


Author(s):  
C.-H. Ge ◽  
C.-C. Lin ◽  
C.-H. Ko ◽  
C.-C. Huang ◽  
Y.-C. Huang ◽  
...  

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