ScienceGate
Advanced Search
Author Search
Journal Finder
Blog
Sign in / Sign up
ScienceGate
Search
Author Search
Journal Finder
Blog
Sign in / Sign up
A TCAD simulation study of impact of strain engineering on nanoscale strained Si NMOSFETs with a silicon–carbon alloy stressor
Thin Solid Films
◽
10.1016/j.tsf.2009.09.078
◽
2009
◽
Vol 518
(5)
◽
pp. 1595-1598
◽
Cited By ~ 2
Author(s):
Shu-Tong Chang
◽
Wei-Ching Wang
◽
Chang-Chun Lee
◽
Jacky Huang
Keyword(s):
Simulation Study
◽
Strain Engineering
◽
Strained Si
◽
Silicon Carbon
◽
Tcad Simulation
Download Full-text
Related Documents
Cited By
References
2D-TCAD Simulation Study of Capture Layer and Repellent Layer of Current Filament in Trench-Gate IGBTs
10.1109/sispad54002.2021.9592570
◽
2021
◽
Author(s):
Takeshi Suwa
Keyword(s):
Simulation Study
◽
Current Filament
◽
Tcad Simulation
Download Full-text
A TCAD Simulation Study of Three-Independent-Gate Field-Effect Transistors at the 10-nm Node
IEEE Transactions on Electron Devices
◽
10.1109/ted.2021.3089671
◽
2021
◽
pp. 1-7
Author(s):
Patsy Cadareanu
◽
Pierre-Emmanuel Gaillardon
Keyword(s):
Simulation Study
◽
Field Effect
◽
Field Effect Transistors
◽
Tcad Simulation
◽
Independent Gate
Download Full-text
Hydrogen storage on silicon, carbon, and silicon carbide nanotubes: A combined quantum mechanics and grand canonical Monte Carlo simulation study
International Journal of Hydrogen Energy
◽
10.1016/j.ijhydene.2013.11.037
◽
2014
◽
Vol 39
(4)
◽
pp. 1719-1731
◽
Cited By ~ 20
Author(s):
S.J. Mahdizadeh
◽
E.K. Goharshadi
Keyword(s):
Monte Carlo Simulation
◽
Silicon Carbide
◽
Monte Carlo
◽
Quantum Mechanics
◽
Simulation Study
◽
Grand Canonical Monte Carlo
◽
Monte Carlo Simulation Study
◽
Silicon Carbide Nanotubes
◽
Silicon Carbon
◽
Grand Canonical
Download Full-text
TCAD simulation of hydrogenated amorphous silicon-carbon/microcrystalline-silicon/hydrogenated amorphous silicon-germanium PIN solar cells
Thin Solid Films
◽
10.1016/j.tsf.2009.10.100
◽
2010
◽
Vol 518
(6)
◽
pp. S250-S254
◽
Cited By ~ 11
Author(s):
S.T. Chang
◽
M. Tang
◽
R.Y. He
◽
W.-C. Wang
◽
Z. Pei
◽
...
Keyword(s):
Solar Cells
◽
Amorphous Silicon
◽
Silicon Germanium
◽
Hydrogenated Amorphous Silicon
◽
Microcrystalline Silicon
◽
Silicon Carbon
◽
Tcad Simulation
◽
Amorphous Silicon Germanium
◽
Hydrogenated Amorphous
Download Full-text
TCAD simulation study of independent gate junctionless FET-based flash memory
2012 International Conference on Computing, Electronics and Electrical Technologies (ICCEET)
◽
10.1109/icceet.2012.6203927
◽
2012
◽
Author(s):
R. Srinivasan
◽
R. Ambika
Keyword(s):
Simulation Study
◽
Flash Memory
◽
Tcad Simulation
◽
Independent Gate
Download Full-text
TCAD simulation study of two bit storage flash memory using conventional FinFET and junctionless FET
2012 IEEE International Conference on Advanced Communication Control and Computing Technologies (ICACCCT)
◽
10.1109/icaccct.2012.6322909
◽
2012
◽
Author(s):
R. Srinivasan
◽
R. Ambika
Keyword(s):
Simulation Study
◽
Flash Memory
◽
Tcad Simulation
Download Full-text
Elastic anisotropy of Cu and its impact on stress management for 3D IC: Nanoindentation and TCAD simulation study
Journal of Materials Research
◽
10.1557/jmr.2011.323
◽
2011
◽
Vol 27
(1)
◽
pp. 339-348
◽
Cited By ~ 18
Author(s):
Kong Boon Yeap
◽
Ehrenfried Zschech
◽
Ude D. Hangen
◽
Thomas Wyrobek
◽
Lay Wai Kong
◽
...
Keyword(s):
Stress Management
◽
Simulation Study
◽
Elastic Anisotropy
◽
3D Ic
◽
Tcad Simulation
◽
Image Position
Abstract
Download Full-text
Process-strained Si (PSS) CMOS technology featuring 3D strain engineering
IEEE International Electron Devices Meeting 2003
◽
10.1109/iedm.2003.1269169
◽
2004
◽
Cited By ~ 65
Author(s):
C.-H. Ge
◽
C.-C. Lin
◽
C.-H. Ko
◽
C.-C. Huang
◽
Y.-C. Huang
◽
...
Keyword(s):
Cmos Technology
◽
Strain Engineering
◽
Strained Si
Download Full-text
TCAD Simulation Study of Source and Gate Material-Engineered Double Gate Tunnel Field Effect Transistor
10.1109/phdedits53295.2021.9649483
◽
2021
◽
Author(s):
G H Nayana
◽
Sanjeev Sharma
Keyword(s):
Simulation Study
◽
Field Effect
◽
Field Effect Transistor
◽
Double Gate
◽
Effect Transistor
◽
Tunnel Field Effect Transistor
◽
Tcad Simulation
Download Full-text
Strained-Si heterostructure field effect devices: Strain-engineering in CMOS technology
2007 International Workshop on Physics of Semiconductor Devices
◽
10.1109/iwpsd.2007.4472453
◽
2007
◽
Cited By ~ 1
Author(s):
C. K. Maiti
Keyword(s):
Field Effect
◽
Cmos Technology
◽
Strain Engineering
◽
Strained Si
◽
Field Effect Devices
Download Full-text
Sign in / Sign up
Close
Export Citation Format
Close
Share Document
Close