Cold deposition of large-area amorphous hydrogenated silicon films by dielectric barrier discharge chemical vapor deposition

2011 ◽  
Vol 519 (15) ◽  
pp. 5038-5042 ◽  
Author(s):  
He. Haiyan ◽  
Gao Qian ◽  
Zhang Xiwen ◽  
Han Gaorong
Keyword(s):  
Chemical Vapor Deposition ◽  
Dielectric Barrier Discharge ◽  
Vapor Deposition ◽  
Barrier Discharge ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Large Area ◽  
Dielectric Barrier ◽  
Hydrogenated Silicon ◽  
Amorphous Hydrogenated Silicon

Amorphous Hydrogenated Silicon Films for Solar Cell Application Obtained with 55 kHz Plasma Enhanced Chemical Vapor Deposition

1998 ◽  
Vol 145 (7) ◽  
pp. 2508-2512 ◽  
Author(s):  
B. G. Budaguan ◽  
A. A. Sherchenkov ◽  
D. A. Stryahilev ◽  
A. Y. Sazonov ◽  
A. G. Radosel'sky ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Solar Cell Application ◽  
Hydrogenated Silicon ◽  
Amorphous Hydrogenated Silicon
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