Amorphous Hydrogenated Silicon Films for Solar Cell Application Obtained with 55 kHz Plasma Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838669 ◽

1998 ◽

Vol 145 (7) ◽

pp. 2508-2512 ◽

Author(s):

B. G. Budaguan ◽

A. A. Sherchenkov ◽

D. A. Stryahilev ◽

A. Y. Sazonov ◽

A. G. Radosel'sky ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Solar Cell Application ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon

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Cold deposition of large-area amorphous hydrogenated silicon films by dielectric barrier discharge chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2011.01.124 ◽

2011 ◽

Vol 519 (15) ◽

pp. 5038-5042 ◽

Author(s):

He. Haiyan ◽

Gao Qian ◽

Zhang Xiwen ◽

Han Gaorong

Keyword(s):

Chemical Vapor Deposition ◽

Dielectric Barrier Discharge ◽

Vapor Deposition ◽

Barrier Discharge ◽

Chemical Vapor ◽

Silicon Films ◽

Dielectric Barrier ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon

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High-Quality 1 eV In0.3Ga0.7As on GaAs Substrate by Metalorganic Chemical Vapor Deposition for Inverted Metamorphic Solar Cell Application

Applied Physics Express ◽

10.1143/apex.4.075501 ◽

2011 ◽

Vol 4 (7) ◽

pp. 075501 ◽

Author(s):

Hong Quan Nguyen ◽

Edward Yi Chang ◽

Hung Wei Yu ◽

Kung Liang Lin ◽

Chen Chen Chung

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gaas Substrate ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Solar Cell Application ◽

Metalorganic Chemical

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VUV laser (157 nm) chemical vapor deposition of high quality amorphous hydrogenated silicon: gas phase chemistry and modelling

Applied Surface Science ◽

10.1016/0169-4332(94)00459-5 ◽

1995 ◽

Vol 86 (1-4) ◽

pp. 521-529 ◽

Author(s):

H. Karstens ◽

J. Knobloch ◽

A. Winkler ◽

A. Pusel ◽

M. Barth ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

High Quality ◽

Hydrogenated Silicon ◽

Gas Phase Chemistry ◽

Amorphous Hydrogenated Silicon ◽

Phase Chemistry

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High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(02)00053-3 ◽

2002 ◽

Vol 74 (1-4) ◽

pp. 97-105 ◽

Author(s):

I.O Parm ◽

K Kim ◽

D.G Lim ◽

J.H Lee ◽

J.H Heo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Solar Cell Application ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Growth of long aligned carbon nanotubes on amorphous hydrogenated silicon nitride by thermal chemical vapor deposition

Materials Letters ◽

10.1016/j.matlet.2009.02.050 ◽

2009 ◽

Vol 63 (15) ◽

pp. 1249-1251 ◽

Author(s):

Sangeeta Handuja ◽

Sarab Preet Singh ◽

P. Srivastava ◽

V.D. Vankar

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hydrogenated Silicon ◽

Thermal Chemical Vapor Deposition ◽

Amorphous Hydrogenated Silicon ◽

Aligned Carbon Nanotubes

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Preparation of amorphous hydrogenated silicon-germanium material and solar cells using the thermocatalytic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.123525 ◽

1999 ◽

Vol 74 (9) ◽

pp. 1284-1286 ◽

Author(s):

M. Lill ◽

B. Schröder

Keyword(s):

Solar Cells ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Germanium ◽

Chemical Vapor ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon

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High-Density Microwave Plasma-Enhanced Chemical Vapor Deposition of Crystalline Silicon Films for Solar Cell Devices

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.93.109 ◽

2003 ◽

Vol 93 ◽

pp. 109-114 ◽

Author(s):

Hajime Shirai ◽

Go Ohkawara ◽

Masanobu Nakajima

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Crystalline Silicon ◽

Chemical Vapor ◽

High Density ◽

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Chemical vapor deposition of amorphous hydrogenated silicon: Chemistry–structure–performance relationships

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586341 ◽

1992 ◽

Vol 10 (1) ◽

pp. 239 ◽

Author(s):

Peter Hess

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon ◽

Silicon Chemistry

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Effects of Ammonia Plasma Treatment on the Electrical Properties of Plasma-Enhanced Chemical Vapor Deposition Amorphous Hydrogenated Silicon Carbide Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.5734 ◽

2002 ◽

Vol 41 (Part 1, No. 9) ◽

pp. 5734-5738 ◽

Author(s):

Yan-Way Li ◽

Chia-Fu Chen

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Plasma Treatment ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hydrogenated Silicon ◽

Ammonia Plasma ◽

Amorphous Hydrogenated Silicon

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High-performance a-SiGe:H thin film prepared by plasma-enhanced chemical vapor deposition with high plasma power for solar-cell application

physica status solidi (a) ◽

10.1002/pssa.201228281 ◽

2012 ◽

Vol 209 (12) ◽

pp. 2527-2531 ◽

Author(s):

Baojun Yan ◽

Lei Zhao ◽

Bending Zhao ◽

Jingwei Chen ◽

Guanghong Wang ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

High Performance ◽

Chemical Vapor ◽

High Plasma ◽

Plasma Power ◽

Solar Cell Application ◽

High Plasma Power

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