scholarly journals Synthesis of nanocrystalline δ-MoN by thermal annealing of amorphous thin films grown on (100) Si by reactive sputtering at room temperature

2018 ◽  
Vol 660 ◽  
pp. 242-246 ◽  
Author(s):  
N. Haberkorn ◽  
S. Bengio ◽  
H. Troiani ◽  
S. Suárez ◽  
P.D. Pérez ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Room Temperature ◽  
Reactive Sputtering ◽  
Amorphous Thin Films

Thermal annealing induced multiple phase in V/V2O5 alternating multilayer structure

2016 ◽  
Vol 30 (27) ◽  
pp. 1650210 ◽  
Author(s):  
B. Ilahi ◽  
M. Abdel-Rahman ◽  
Z. Zaaboub ◽  
M. F. Zia ◽  
M. Alduraibi ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Oxygen Diffusion ◽  
Multilayer Structure ◽  
Room Temperature ◽  
Optical And Electrical Properties ◽  
Film Resistance ◽  
Dc Magnetron Sputtering ◽  
Temperature Coefficient Of Resistance ◽  
Multiple Phase

In this paper, we report on microstructural, optical and electrical properties of alternating multilayer of vanadium pentoxide (V2O5), 25 nm, and vanadium (V), 5 nm, thin films deposited at room temperature by radio frequency (RF) and DC magnetron sputtering, respectively. Raman and photoluminescence (PL) spectroscopy have been employed to investigate the effects of thermal annealing for 20, 30 and 40 min at 400[Formula: see text]C in Nitrogen (N2) atmosphere on the multiple phase formation and its impact on the film resistance and temperature coefficient of resistance (TCR). We demonstrate that the oxygen free annealing environment allows the formation of multiple phases including V2O5, V6O[Formula: see text] and VO2 through oxygen diffusion and consequent deficiency in V2O5 layer.

Room-temperature crystallization of amorphous thin films by RF plasma treatment

2004 ◽  
Author(s):  
Hisashi Ohsaki ◽  
Y. Shibayama ◽  
A. Kinbara ◽  
T. Watanabe ◽  
K. Fukuhisa ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Treatment ◽  
Room Temperature ◽  
Rf Plasma ◽  
Amorphous Thin Films ◽  
Temperature Crystallization

Formation of Si islands from amorphous thin films upon thermal annealing

1999 ◽  
Vol 85 (12) ◽  
pp. 8492-8494 ◽  
Author(s):  
Yutaka Wakayama ◽  
Takashi Tagami ◽  
Shun-ichiro Tanaka
Keyword(s):  
Thin Films ◽  
Thermal Annealing ◽  
Amorphous Thin Films

Structural Variation of Transition Metal - Fullerene Thin Films Modified by Thermal Annealing and Ion or Laser Beam Bombardment

2012 ◽  
Vol 463-464 ◽  
pp. 1387-1391 ◽  
Author(s):  
Jiri Vacik ◽  
Vasyl Lavrentev ◽  
Pavel Horak ◽  
R. Fajgar
Keyword(s):  
Thin Films ◽  
Transition Metal ◽  
Thermal Annealing ◽  
Large Scale ◽  
Room Temperature ◽  
Structural Variation ◽  
Ion Irradiation ◽  
Strong Impact ◽  
Hybrid Films ◽  
Structural Morphology

In this paper, we have inspected the structural morphology of novel composite materials - transition metal (TM) (Ni, Ti) / fullerene (C60) thin films, prepared at room temperature (RT) or 500°C, and modified by ion-irradiation and/or thermal annealing. The hybrid films were synthesized by alternative or simultaneous deposition of the immiscible TM and C60 phases. As deposited (at RT) the hybrid systems were thermodynamically unstable and the internal stress induced lengthy phase separation. Co-deposition at 500°C resulted in the formation of a large-scale pattern structure. By high temperature annealing of the multilayer’s a new morphology could be synthesized. In addition, high-fluence ion-irradiation induces C60 fragmentation that has a strong impact on the final shaping of the resulted morphology.

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