Nanoindentation combined with scanning force microscope for characterization of mechanical properties of carbon nitride thin films

2004 ◽  
Vol 177-178 ◽  
pp. 537-544 ◽  
Author(s):  
S. Chowdhury ◽  
M.T. Laugier ◽  
I.Z. Rahman ◽  
M. Serantoni
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Carbon Nitride ◽  
Scanning Force Microscope ◽  
Scanning Force

Photoacoustic characterization of the mechanical properties of thin films

2002 ◽  
Vol 80 (4) ◽  
pp. 691-693 ◽  
Author(s):  
Carmen M. Hernandez ◽  
Todd W. Murray ◽  
Sridhar Krishnaswamy
Keyword(s):  
Thin Films ◽  
Mechanical Properties

Correlation between bonding structure and mechanical properties of amorphous carbon nitride thin films

2000 ◽  
Vol 125 (1-3) ◽  
pp. 284-288 ◽  
Author(s):  
C. Quirós ◽  
R. Núñez ◽  
P. Prieto ◽  
I. Vergara ◽  
D. Cáceres ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Bonding Structure ◽  
Amorphous Carbon Nitride

Deposition and Characterization of Carbon Nitride Films by Laser Processed Methods

1998 ◽  
Vol 526 ◽  
Author(s):  
Ashok Kumar ◽  
R. Alexandrescu ◽  
Michael A. George
Keyword(s):  
Thin Films ◽  
Comparative Analysis ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Carbon Nitride ◽  
Pyrolytic Graphite ◽  
Chemical Vapor ◽  
Nitrogen Atmosphere ◽  
Graphite Target

AbstractLaser assisted methods such as laser physical vapor deposition (LPVD) and laser induced chemical vapor deposition (LCVD) have been utilized to grow carbon nitride (CNx) films on various substrates. It has been shown that the both techniques produce good quality thin films of CNx. In LPVD, a laser beam (λ= 248 nm) has been used to ablate the pyrolytic graphite target in nitrogen atmosphere, where as CO2 laser was to irradiate carbon-nitrogen containing mixtures such as C2H2/N2O/NH3 in LCVD method. A comparative analysis will be presented in terms of structural properties of CNx films prepared by both techniques.

Characterization of Nanoporous Low Dielectric Polysilsesquioxane Thin Films

2005 ◽  
Vol 277-279 ◽  
pp. 907-911
Author(s):  
Jingyu Hyeon Lee ◽  
Yi Yeol Lyu ◽  
Mong Sup Lee ◽  
Jin Heong Yim ◽  
Sang Youl Kim
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Dielectric Constant ◽  
Refractive Index ◽  
Elastic Modulus ◽  
Polymer Matrix ◽  
Low Dielectric

Poly(methyl-co-cyclosiloxane bearing silsesquioxane)s (P(M-co-CSSQs)) were prepared. Using poly(e-caprolactone) (PCL) as a template, PCL / P(M-co-CSSQ) nanohybrid films were fabricated. The electrical, morphological, and mechanical properties of the PCL / P(M-co-CSSQ) films were investigated. The dielectric constant of a cured PCL / P(M-co-CSSQ) film at 420°C scaled down from 2.55 to 2.05 and refractive index from 1.41 to 1.33 when 20 vol. % of the PCL was admixed with the polymer matrix. The elastic modulus and hardness of the cured PCL / P(Mco- CSSQ) (2:8, vol./vol.) film were 2.50 and 0.32 GPa, respectively, showing dependency on the PCL content.

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