Sputtering Deposition of Sandwich-Structured V2O5/Metal (V, W)/V2O5 Multilayers for the Preparation of High-Performance Thermally Sensitive VO2 Thin Films with Selectivity of VO2 (B) and VO2 (M) Polymorph

2016 ◽  
Vol 8 (12) ◽  
pp. 7884-7890 ◽  
Author(s):  
Hengwu Liu ◽  
Dongyun Wan ◽  
Ahmad Ishaq ◽  
Lanli Chen ◽  
Beibei Guo ◽  
...  
Keyword(s):  
Thin Films ◽  
High Performance ◽  
Sputtering Deposition ◽  
Vo2 Thin Films

High-performance MgO thin films for PDPs with a high-rate sputtering-deposition process

2008 ◽  
Vol 16 (12) ◽  
pp. 1195 ◽  
Author(s):  
Masaharu Terauchi ◽  
Jun Hashimoto ◽  
Hikaru Nishitani ◽  
Yusuke Fukui ◽  
Michiko Okafuji ◽  
...  
Keyword(s):  
Thin Films ◽  
High Performance ◽  
Deposition Process ◽  
High Rate ◽  
Sputtering Deposition

scholarly journals Low temperature fabrication of thermochromic VO2 thin films by low-pressure chemical vapor deposition

RSC Advances ◽  
2017 ◽  
Vol 7 (18) ◽  
pp. 10798-10805 ◽  
Author(s):  
Beibei Guo ◽  
Lanli Chen ◽  
Siqi Shi ◽  
Ahmad Ishaq ◽  
Dongyun Wan ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
First Principles ◽  
High Performance ◽  
Chemical Vapor ◽  
First Principles Calculations ◽  
Pressure Chemical ◽  
Vo2 Thin Films

High-performance thermochromic VO2 films were fabricated by LPCVD, and the mechanism for their low transition temperatures was studied using first-principles calculations.

scholarly journals Roles of TiO2 buffer layer for preparation of high performance VO2 thin films with Monoclinic polymorph

2018 ◽  
Vol 10 ◽  
pp. 628-632 ◽  
Author(s):  
Cong Zhang ◽  
Chaoyang Kang ◽  
Haitao Zong ◽  
Shanshan Liang ◽  
Chenchen Geng ◽  
...  
Keyword(s):  
Thin Films ◽  
Buffer Layer ◽  
High Performance ◽  
Tio2 Buffer Layer ◽  
Vo2 Thin Films

scholarly journals Plasma Assisted Diffusion in Porous Materials: Experiments, Modeling and Applications

2012 ◽  
Vol 323-325 ◽  
pp. 387-391 ◽  
Author(s):  
Pascal Brault ◽  
Jean Marc Bauchire ◽  
François James ◽  
Christophe Josserand
Keyword(s):  
Thin Films ◽  
Porous Medium ◽  
High Performance ◽  
Time Dependent ◽  
Sputtering Deposition ◽  
Depth Profiles ◽  
Physical Mechanisms ◽  
Plasma Sputtering ◽  
And Control ◽  
Concentration Depth Profiles

Plasma sputtering deposition of platinum on porous substrates is a relevant way for building high performance catalytic thin films. The knowledge and control of platinum density adsorbed in the porous medium, during deposition, are of primary importance. We show that the experimental concentration depth profiles originate from a superdiffusion phenomenon. Moreover experimental results are well described by a classical porous-fractal diffusion model, for which diffusion coefficient is also time-dependent, even if such a model does not include the proper physical mechanisms.

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