Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
2017 ◽
Vol 9
(2)
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pp. 1858-1869
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Keyword(s):
Wet Etch
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2016 ◽
Vol 28
(16)
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pp. 5864-5871
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Keyword(s):
2015 ◽
Vol 7
(35)
◽
pp. 19857-19862
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2018 ◽
Vol 36
(3)
◽
pp. 031514
◽
Keyword(s):
Keyword(s):
Keyword(s):
2020 ◽
Vol 38
(6)
◽
pp. 062406
Keyword(s):
Keyword(s):