Redeposition in plasma-assisted atomic layer deposition: Silicon nitride film quality ruled by the gas residence time
2015 ◽
Vol 107
(1)
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pp. 014102
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Harm C. M. Knoops
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K. de Peuter
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W. M. M. Kessels
2017 ◽
Vol 133
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pp. 10-16
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Pei-Ci Jhang
◽
Chi-Pin Lu
◽
Jung-Yu Shieh
◽
Ling-Wu Yang
◽
Tahone Yang
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...
2020 ◽
Vol MA2020-02
(14)
◽
pp. 1387-1387
Tapei Nishihara
◽
Ryo Yokogawa
◽
Yuji Otsuki
◽
Munehito Kagaya
◽
Atsushi Ogura
2020 ◽
Vol 98
(3)
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pp. 113-120
Tapei Nishihara
◽
Ryo Yokogawa
◽
Yuji Otsuki
◽
Munehito Kagaya
◽
Atsushi Ogura
2020 ◽
Vol 13
(6)
◽
pp. 066002
Sun Jung Kim
◽
Sang Heon Yong
◽
Heeyeop Chae
1999 ◽
Vol 75
(11)
◽
pp. 1521-1523
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Jae-Sik Min
◽
Hyung-Sang Park
◽
Sang-Won Kang
Golnaz Karbasian
◽
Alexei O. Orlov
◽
Alexander S. Mukasyan
◽
Gregory L. Snider
Byunguk Kim
◽
Namgue Lee
◽
Junghoon Lee
◽
Taehun Park
◽
Hyunwoo Park
◽
...
2020 ◽
Vol 38
(6)
◽
pp. 062406
Triratna Muneshwar
◽
Ken Cadien