scholarly journals Aqueous copper(0) mediated reversible deactivation radical polymerization of 2-hydroxyethyl acrylate

2015 ◽  
Vol 6 (36) ◽  
pp. 6509-6518 ◽  
Author(s):  
Mingmin Zhang ◽  
Michael F. Cunningham ◽  
Robin A. Hutchinson
Keyword(s):  
Aqueous Solution ◽  
Molecular Weight ◽  
High Molecular Weight ◽  
Radical Polymerization ◽  
Reversible Deactivation ◽  
Reversible Deactivation Radical Polymerization

Lowering the concentration of adsorbed radicals on the Cu(0) surface, achieved by reducing catalyst and adding NaBr, is the key to the synthesis of well-defined P(HEA) without a high molecular weight shoulder in aqueous solution using two-step Cu(0)in situmediation.

Hexamethylphosphoramide as a highly reactive catalyst for the reversible-deactivation radical polymerization of MMA with an in situ formed alkyl iodide initiator

2017 ◽  
Vol 8 (39) ◽  
pp. 6073-6085 ◽  
Author(s):  
Yan-an Wang ◽  
Yan Shi ◽  
Zhifeng Fu ◽  
Wantai Yang
Keyword(s):  
Methyl Methacrylate ◽  
Radical Polymerization ◽  
Alkyl Iodide ◽  
Highly Efficient ◽  
Reversible Deactivation ◽  
Reversible Deactivation Radical Polymerization ◽  
Organic Catalyst

A novel and highly efficient organic catalyst for the reversible-deactivation radical polymerization (RDRP) of methyl methacrylate with anin situformed alkyl iodide initiator.

Reversible-deactivation radical polymerization of chloroprene and the synthesis of novel polychloroprene-based block copolymers by the RAFT approach

RSC Advances ◽  
2014 ◽  
Vol 4 (98) ◽  
pp. 55529-55538 ◽  
Author(s):  
Jia Hui ◽  
Zhijiao Dong ◽  
Yan Shi ◽  
Zhifeng Fu ◽  
Wantai Yang
Keyword(s):  
Molecular Weight ◽  
Block Copolymers ◽  
Radical Polymerization ◽  
Molecular Weights ◽  
Molecular Weight Distributions ◽  
Weight Distributions ◽  
Reversible Deactivation ◽  
Raft Agent ◽  
Reversible Deactivation Radical Polymerization

Novel, well-defined PCP-based block copolymers (PSt-b-PCP and PMMA-b-PCP) with controlled number averaged molecular weights and molecular weight distributions can be prepared, employing EPDTB and CPDB, respectively, as the initial RAFT agent.

scholarly journals One-Step Photocontrolled Polymerization-Induced Self-Assembly (Photo-PISA) by Using In Situ Bromine-Iodine Transformation Reversible-Deactivation Radical Polymerization

Polymers ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 150 ◽  
Author(s):  
Haihui Li ◽  
Qinghua Xu ◽  
Xiang Xu ◽  
Lifen Zhang ◽  
Zhenping Cheng ◽  
...  
Keyword(s):  
Radical Polymerization ◽  
Self Assembly ◽  
Solid Content ◽  
Transition Metal Catalysts ◽  
Water Soluble ◽  
Step Method ◽  
Reversible Deactivation ◽  
One Step ◽  
Reversible Deactivation Radical Polymerization

Polymerization-induced self-assembly (PISA) has become an effective strategy to synthesize high solid content polymeric nanoparticles with various morphologies in situ. In this work, one-step PISA was achieved by in situ photocontrolled bromine-iodine transformation reversible-deactivation radical polymerization (hereinafter referred to as Photo-BIT-RDRP). The water-soluble macroinitiator precursor α-bromophenylacetate polyethylene glycol monomethyl ether ester (mPEG1k-BPA) was synthesized in advance, and then the polymer nanomicelles (mPEG1k-b-PBnMA and mPEG1k-b-PHPMA, where BnMA means benzyl methacrylate and HPMA is hydroxypropyl methacrylate) were successfully formed from a PISA process of hydrophobic monomer of BnMA or HPMA under irradiation with blue LED light at room temperature. In addition, the typical living features of the photocontrolled PISA process were confirmed by the linear increase of molecular weights of the resultant amphiphilic block copolymers with monomer conversions and narrow molecular weight distributions (Mw/Mn < 1.20). Importantly, the photocontrolled PISA process is realized by only one-step method by using in situ photo-BIT-RDRP, which avoids the use of transition metal catalysts in the traditional ATRP system, and simplifies the synthesis steps of nanomicelles. This strategy provides a promising pathway to solve the problem of active chain end (C-I) functionality loss in two-step polymerization of BIT-RDRP.

Photocontrolled iodine-mediated reversible-deactivation radical polymerization with a semifluorinated alternating copolymer as the macroinitiator

2020 ◽  
Vol 11 (47) ◽  
pp. 7497-7505
Author(s):  
Jiannan Cheng ◽  
Kai Tu ◽  
Enjie He ◽  
Jinying Wang ◽  
Lifen Zhang ◽  
...  
Keyword(s):  
Block Copolymers ◽  
Radical Polymerization ◽  
Room Temperature ◽  
Blue Led ◽  
Led Light ◽  
Alternating Copolymers ◽  
Alternating Copolymer ◽  
Reversible Deactivation ◽  
Novel Strategy ◽  
Reversible Deactivation Radical Polymerization

A novel strategy for preparing block copolymers with semifluorinated alternating copolymers as macroinitiators was established by photocontrolled iodine-mediated RDRP under irradiation with blue LED light at room temperature.

scholarly journals Achieving Good Protection on Ultra-High Molecular Weight Polythene by In Situ Growth of Amorphous Carbon Film

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 584
Author(s):  
Rui Dang ◽  
Liqiu Ma ◽  
Shengguo Zhou ◽  
Deng Pan ◽  
Bin Xia
Keyword(s):  
Molecular Weight ◽  
Epitaxial Growth ◽  
High Molecular Weight ◽  
Amorphous Carbon ◽  
Transition Layer ◽  
In Situ Growth ◽  
Good Protection ◽  
Ultra High Molecular Weight ◽  
Carbon Plasma

Ultra-high molecular weight polythene (UHMWPE), with outstanding characteristics, is widely applied in modern industry, while it is also severely limited by its inherent shortcomings, which include low hardness, poor wear resistance, and easy wear. Implementation of feasible protection on ultra-high molecular weight polythene to overcome its shortcomings would be of significance. In the present study, amorphous carbon (a-C) film was fabricated on ultra-high molecular weight polythene (UHMWPE) to provide good protection, and the relevant growth mechanism of a-C film was revealed by controlling carbon plasma currents. The results showed the in situ transition layer, in the form of chemical bonds, was formed between the UHMWPE substrate and the a-C film with the introduction of carbon plasma, which provided strong adhesion, and then the a-C film continued epitaxial growth on the in situ transition layer with the treatment of carbon plasma. This in situ growth of a-C film, including the in situ transition layer and the epitaxial growth layer, significantly improved the wetting properties, mechanical properties, and tribological properties of UHMWPE. In particular, good protection by in situ growth a-C film on UHMWPE was achieved during sliding wear.

Reversible-Deactivation Radical Polymerization in the Presence of Metallic Copper. Comproportionation–Disproportionation Equilibria and Kinetics

2013 ◽  
Vol 46 (10) ◽  
pp. 3793-3802 ◽  
Author(s):  
Yu Wang ◽  
Mingjiang Zhong ◽  
Weipu Zhu ◽  
Chi-How Peng ◽  
Yaozhong Zhang ◽  
...  
Keyword(s):  
Radical Polymerization ◽  
Metallic Copper ◽  
Reversible Deactivation ◽  
Reversible Deactivation Radical Polymerization
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