Shaping thin film growth and microstructure pathways via plasma and deposition energy: a detailed theoretical, computational and experimental analysis

2017 ◽  
Vol 19 (7) ◽  
pp. 5591-5610 ◽  
Author(s):  
Bibhuti Bhusan Sahu ◽  
Jeon Geon Han ◽  
Holger Kersten
Keyword(s):  
Thin Film ◽  
Experimental Analysis ◽  
Film Growth ◽  
Plasma Chemistry ◽  
Thin Film Growth ◽  
Plasma Process ◽  
Energy Control ◽  
Si Thin Film ◽  
Deposition Energy

An advanced plasma process using plasma chemistry and energy control for engineering Si thin film growth and microstructure is demonstrated.

Polycrystalline Si thin film growth on glass using pulsed d.c. magnetron sputtering

2002 ◽  
Vol 420-421 ◽  
pp. 429-432 ◽  
Author(s):  
Min J. Jung ◽  
Yun M. Jung ◽  
Leonid R. Shaginyan ◽  
Jeon G. Han
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Film Growth ◽  
Thin Film Growth ◽  
Si Thin Film

a-Si thin-film growth by sputtering: A Monte Carlo study

1987 ◽  
Vol 35 (14) ◽  
pp. 7611-7617 ◽  
Author(s):  
J. Ferrón ◽  
R. R. Koropecki ◽  
R. Arce
Keyword(s):  
Thin Film ◽  
Monte Carlo ◽  
Film Growth ◽  
Monte Carlo Study ◽  
Thin Film Growth ◽  
Si Thin Film

scholarly journals Thin film growth of heavy fermion chiral magnet YbNi3Al9

2021 ◽  
Vol 118 (10) ◽  
pp. 102402
Author(s):  
Hiroaki Shishido ◽  
Akira Okumura ◽  
Tatsuya Saimyoji ◽  
Shota Nakamura ◽  
Shigeo Ohara ◽  
...  
Keyword(s):  
Thin Film ◽  
Heavy Fermion ◽  
Film Growth ◽  
Thin Film Growth

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

2021 ◽  
Author(s):  
Kristina Ashurbekova ◽  
Karina Ashurbekova ◽  
Iva Saric ◽  
Evgeny Modin ◽  
Mladen Petravic ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Molecular Layer ◽  
Thin Film Growth ◽  
Cross Linking ◽  
Layer By Layer ◽  
Molecular Layer Deposition ◽  
Layer Deposition ◽  
Hybrid Thin Films ◽  
Enhanced Stability

We developed a thin film growth with a radical-initiated cross-linking of vinyl groups in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited improved properties like 12% higher density and enhanced stability compared to the non-cross-linked film.

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

Atomically controlled surfaces with step and terrace of β-Ga2O3 single crystal substrates for thin film growth

2008 ◽  
Vol 254 (23) ◽  
pp. 7838-7842 ◽  
Author(s):  
Shigeo Ohira ◽  
Naoki Arai ◽  
Takayoshi Oshima ◽  
Shizuo Fujita
Keyword(s):  
Thin Film ◽  
Single Crystal ◽  
Film Growth ◽  
Thin Film Growth
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