Atmospheric pressure plasma assisted reaction chemical ionization for analysis of chlorinated compounds separated by liquid chromatography

2017 ◽  
Vol 32 (9) ◽  
pp. 1757-1765 ◽  
Author(s):  
Joseph E. Lesniewski ◽  
William P. McMahon ◽  
Kunyu Zheng ◽  
Haopeng Wang ◽  
Hamid Badiei ◽  
...  

We report development of an atmospheric pressure plasma assisted reaction chemical ionization (PARCI) source with liquid sample introduction, enabling high sensitivity detection of chlorine in LC-separated compounds.

Polymers ◽  
2021 ◽  
Vol 13 (11) ◽  
pp. 1783
Author(s):  
Choon-Sang Park ◽  
Do Yeob Kim ◽  
Eun Young Jung ◽  
Hyo Jun Jang ◽  
Gyu Tae Bae ◽  
...  

New nanostructured conducting porous polythiophene (PTh) films are directly deposited on substrates at room temperature (RT) by novel atmospheric pressure plasma jets (APPJs) polymerization technique. The proposed plasma polymerization synthesis technique can grow the PTh films with a very fast deposition rate of about 7.0 μm·min−1 by improving the sufficient nucleation and fragment of the thiophene monomer. This study also compares pure and iodine (I2)-doped PTh films to demonstrate the effects of I2 doping. To check the feasibility as a sensing material, NO2-sensing properties of the I2-doped PTh films-based gas sensors are also investigated. As a result, the proposed APPJs device can produce the high density, porous and ultra-fast polymer films, and polymers-based gas sensors have high sensitivity to NO2 at RT. Our approach enabled a series of processes from synthesis of sensing materials to fabrication of gas sensors to be carried out simultaneously.


PIERS Online ◽  
2010 ◽  
Vol 6 (7) ◽  
pp. 636-639
Author(s):  
Toshiyuki Nakamiya ◽  
Fumiaki Mitsugi ◽  
Shota Suyama ◽  
Tomoaki Ikegami ◽  
Yoshito Sonoda ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.


2018 ◽  
Vol 677 (1) ◽  
pp. 135-142
Author(s):  
Dong Ha Kim ◽  
Choon-Sang Park ◽  
Eun Young Jung ◽  
Bhum Jae Shin ◽  
Jae Young Kim ◽  
...  

Author(s):  
Thisara Sandanuwan ◽  
Nayanathara Hendeniya ◽  
D.A.S. Amarasinghe ◽  
Dinesh Attygalle ◽  
Sampath Weragoda

Author(s):  
Kenneth A. Cornell ◽  
Amanda White ◽  
Adam Croteau ◽  
Jessica Carlson ◽  
Zeke Kennedy ◽  
...  

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