Incorporation-limiting mechanisms during nitrogenation of monolayer graphene films in nitrogen flowing afterglows
Keyword(s):
Modification of graphene films in the flowing afterglow of microwave N2 plasmas. Nitrogenation is first limited by the formation of defect sites by plasma-generated N and N2(A) at low damage and then by the adsorption of nitrogen atoms at high damage.
Keyword(s):
Keyword(s):
2012 ◽
Vol 18
(6)
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pp. 1342-1354
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2020 ◽
Vol 7
(1)
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pp. 015024
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2017 ◽
Vol 43
(17)
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pp. 15010-15017
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