Tribological properties of hydrogenated boron carbide (BxC:Hy) thin films on stainless steel deposited by RF-PECVD technique

2020 ◽  
Vol 91 (2) ◽  
pp. 21301
Author(s):  
Arundhati Bute ◽  
Neelima Khare ◽  
Sanjiv Kumar ◽  
Debarati Bhattacharya ◽  
Kulwant Singh ◽  
...  
Keyword(s):  
Thin Films ◽  
Wear Resistance ◽  
Tribological Properties ◽  
Friction And Wear ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
High Hardness ◽  
Self Bias ◽  
Deposition Parameters ◽  
Frequency Plasma

This study narrates the findings regarding investigation of tribological properties of BxC:Hy thin films deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD) technique. To study tribological properties, two sets of films were prepared with variation in composition and thickness by tuning deposition parameters. Tribological properties were studied in ambience for three different applied vertical load values (5, 10 and 15 N). Lower self-bias (−75 V) seems advantageous for synthesis of BxC:Hy films offering superior hardness, lubricity and wear resistance in tribologically stressed conditions. For a given composition, the film with the highest thickness (∼3 μm) exhibited better friction and wear resistance, offering lowest co-efficient of friction (COF) ∼0.23 for 5 N load and specific wear rate of 2.56 × 10−5 mm3/Nm for 10 N load. Lower self-bias during deposition (−75 V) seems advantageous for synthesis of BxC:Hy films having high hardness (∼2800 HK) and excellent Co-efficient of friction (COF).

Self-Supporting Nanocrystalline Diamond Foils – A New Concept for Crystalline Diamond on any Technical Surface

2010 ◽  
Vol 438 ◽  
pp. 163-169 ◽  
Author(s):  
Matthias A. Lodes ◽  
Stefan M. Rosiwal ◽  
Robert F. Singer
Keyword(s):  
Thermal Conductivity ◽  
Friction And Wear ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
High Hardness ◽  
Nanocrystalline Diamond ◽  
Temperature Sensitive ◽  
Light Metals ◽  
Temperature Application ◽  
Hot Filament

The manufacturing and application of self-supporting nanocrystalline diamond foils is introduced. The high temperature manufacturing of nanocrystalline diamond foils by hot-filament chemical vapour deposition (HFCVD) is separated from the low temperature application, allowing the coating of temperature sensitive materials, which cannot be coated by HFCVD conventionally. By coating appropriate template materials and stripping-off after the CVD-process, self-supporting, flexible nanocrystalline diamond foils with high hardness (> 70 GPa) and very low thermal conductivity (< 1 W/mK) with thicknesses of up to 100 µm can be produced. Lasercutting is an appropriate method for machining any desired geometry. Thus the possibility to use the extreme properties of diamond for protection against friction and wear on new substrate materials, e.g. steels, light metals and polymers, is generated.

scholarly journals Analysis of Properties of Hard Coatings and Wear Resistance of Chemical Vapour Deposition (PVD) Coated Technology

2015 ◽  
Vol 63 (5) ◽  
pp. 1477-1483
Author(s):  
Pavel Hudeček ◽  
Petr Dostál
Keyword(s):  
Wear Resistance ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
High Hardness ◽  
Life Time ◽  
Hard Coatings ◽  
Technological Properties ◽  
Coating Methods ◽  
Hot Hardness

Modern coating methods are having become an important part of industry. Wear resistance, durability, toughness (breakage resistance) and hot hardness (high hardness and chemical stability at high temperature) are the four main technological properties necessary for durability and long life time. These proprieties are for productivity, economy and ecology very important point. This resource deals with the analysis of properties of hard coatings and wear resistance of chemical vapour deposition (PVD) coated technology. It focuses on the preparation, execution and evaluation of test coatings on the front ball-milling cutters. Examination of these characteristic properties may give into an insight to the reason why some systems show excellent wear characteristic.

scholarly journals Optimering van die plasmaondersteunde chemiese dampdeponering van kwartsagtige lagies by lae temperature

1996 ◽  
Vol 15 (1) ◽  
pp. 23-30
Author(s):  
P. L. Crouse ◽  
J. A. Bester
Keyword(s):  
Thin Films ◽  
Experimental Design ◽  
Room Temperature ◽  
Vapour Deposition ◽  
Simple Technique ◽  
Plasma Reactor ◽  
Chemical Vapour ◽  
Physical Property ◽  
Radio Frequency Plasma ◽  
Frequency Plasma

Results pertaining to the plasma-assisted chemical vapour deposition (PACVD) of SiOᵪCᵧ thin films at room temperature using a self-biasing radio-frequency plasma reactor are presented. Response surface analysis was used for experimental design. A simple technique is illustrated for the optimizing of any physical property, subject to the constraints imposed by the apparatus and by the required values of other physical properties.

scholarly journals Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)

RSC Advances ◽  
2021 ◽  
Vol 11 (36) ◽  
pp. 22199-22205
Author(s):  
Rachel L. Wilson ◽  
Thomas J. Macdonald ◽  
Chieh-Ting Lin ◽  
Shengda Xu ◽  
Alaric Taylor ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hole Transport ◽  
Blocking Layer ◽  
The Novel ◽  
Electron Blocking Layer

We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.

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