scholarly journals Uniaxial compression effects on conduction mechanisms in p-type gallium antimonide

1976 ◽  
Vol 37 (11) ◽  
pp. 1347-1357 ◽  
Author(s):  
M. Averous ◽  
J. Calas ◽  
C. Fau ◽  
J. Bonnafe
1973 ◽  
Vol 60 (2) ◽  
pp. K83-K86 ◽  
Author(s):  
M. Saint Paul ◽  
J. P. Jay-Gerin ◽  
A. Briggs

1990 ◽  
Vol 57 (21) ◽  
pp. 2256-2258 ◽  
Author(s):  
T. M. Rossi ◽  
D. A. Collins ◽  
D. H. Chow ◽  
T. C. McGill

1984 ◽  
Vol 50 (1) ◽  
pp. 113-156 ◽  
Author(s):  
J. A. Chroboczek ◽  
F. H. Pollak ◽  
H. F. Staunton

2020 ◽  
Vol 842 ◽  
pp. 155843
Author(s):  
V. Janardhanam ◽  
I. Jyothi ◽  
Yonghun Kim ◽  
Sung-Nam Lee ◽  
Hyung-Joong Yun ◽  
...  

2020 ◽  
Vol 80 (10) ◽  
Author(s):  
S. Bhattarai ◽  
R. Panth ◽  
W.-Z. Wei ◽  
H. Mei ◽  
D.-M. Mei ◽  
...  

AbstractFor the first time, electrical conduction mechanisms in the disordered material system is experimentally studied for p-type amorphous germanium (a-Ge) used for high-purity Ge detector contacts. The localization length and the hopping parameters in a-Ge are determined using the surface leakage current measured from three high-purity planar Ge detectors. The temperature dependent hopping distance and hopping energy are obtained for a-Ge fabricated as the electrical contact materials for high-purity Ge planar detectors. As a result, we find that the hopping energy in a-Ge increases as temperature increases while the hopping distance in a-Ge decreases as temperature increases. The localization length of a-Ge is on the order of $$2.13^{-0.05}_{+0.07}\mathrm{{A}}^\circ $$ 2 . 13 + 0.07 - 0.05 A ∘ to $$5.07^{-0.83}_{+2.58}\mathrm{{A}}^\circ $$ 5 . 07 + 2.58 - 0.83 A ∘ , depending on the density of states near the Fermi energy level within bandgap. Using these parameters, we predict that the surface leakage current from a Ge detector with a-Ge contacts can be much smaller than one yocto amp (yA) at helium temperature, suitable for rare-event physics searches.


1978 ◽  
Vol 27 (6) ◽  
pp. 633-635 ◽  
Author(s):  
B.E. Hadjicontis ◽  
P.C. Euthymiou ◽  
D.I. Kladis

2013 ◽  
Vol 566 ◽  
pp. 179-183
Author(s):  
Shinya Hikita ◽  
Teppei Hayashi ◽  
Yuuki Sato ◽  
Shinzo Yoshikado

Thin films of a composite of molybdenum disilicide (MoSi2) and silicon (Si) were fabricated by radio frequency magnetron sputtering using a target made of a powder mixture of MoSi2 and Si with a Si-to-Mo molar ratio of 1:X (2.0 X 2.5). The Hall coefficients were measured to identify the conduction mechanisms in the thin films. The sign and magnitude of the Hall coefficients revealed that thin films with X = 2.02.2 having a hexagonal crystal structure showed p-type conduction, while the mechanism for the n-type film with X = 2.33 was unknown and that for a composite of hexagonal and an unknown structure with X = 2.3, 2.4 and 2.5 showed mixed conduction.


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