Carrier conduction mechanisms of WSe2/p-type Ge epilayer heterojunction depending on the measurement temperature and applied bias

2020 ◽  
Vol 842 ◽  
pp. 155843
Author(s):  
V. Janardhanam ◽  
I. Jyothi ◽  
Yonghun Kim ◽  
Sung-Nam Lee ◽  
Hyung-Joong Yun ◽  
...  
2020 ◽  
Vol 80 (10) ◽  
Author(s):  
S. Bhattarai ◽  
R. Panth ◽  
W.-Z. Wei ◽  
H. Mei ◽  
D.-M. Mei ◽  
...  

AbstractFor the first time, electrical conduction mechanisms in the disordered material system is experimentally studied for p-type amorphous germanium (a-Ge) used for high-purity Ge detector contacts. The localization length and the hopping parameters in a-Ge are determined using the surface leakage current measured from three high-purity planar Ge detectors. The temperature dependent hopping distance and hopping energy are obtained for a-Ge fabricated as the electrical contact materials for high-purity Ge planar detectors. As a result, we find that the hopping energy in a-Ge increases as temperature increases while the hopping distance in a-Ge decreases as temperature increases. The localization length of a-Ge is on the order of $$2.13^{-0.05}_{+0.07}\mathrm{{A}}^\circ $$ 2 . 13 + 0.07 - 0.05 A ∘ to $$5.07^{-0.83}_{+2.58}\mathrm{{A}}^\circ $$ 5 . 07 + 2.58 - 0.83 A ∘ , depending on the density of states near the Fermi energy level within bandgap. Using these parameters, we predict that the surface leakage current from a Ge detector with a-Ge contacts can be much smaller than one yocto amp (yA) at helium temperature, suitable for rare-event physics searches.


2013 ◽  
Vol 566 ◽  
pp. 179-183
Author(s):  
Shinya Hikita ◽  
Teppei Hayashi ◽  
Yuuki Sato ◽  
Shinzo Yoshikado

Thin films of a composite of molybdenum disilicide (MoSi2) and silicon (Si) were fabricated by radio frequency magnetron sputtering using a target made of a powder mixture of MoSi2 and Si with a Si-to-Mo molar ratio of 1:X (2.0 X 2.5). The Hall coefficients were measured to identify the conduction mechanisms in the thin films. The sign and magnitude of the Hall coefficients revealed that thin films with X = 2.02.2 having a hexagonal crystal structure showed p-type conduction, while the mechanism for the n-type film with X = 2.33 was unknown and that for a composite of hexagonal and an unknown structure with X = 2.3, 2.4 and 2.5 showed mixed conduction.


1993 ◽  
Vol 324 ◽  
Author(s):  
M. Murtagh ◽  
J. T. Beechinor ◽  
P. A. F. Herbert ◽  
P.V. Kelly ◽  
G. M. Crean ◽  
...  

AbstractReactive ion etching (RIE) of p-type 2-3 †cm resistivity silicon (100) was characterised using Photoreflectance (PR), Rutherford Backscattering Spectrometry (RBS) and Spectroscopic Ellipsometry (SE). Isochronal (5 minutes) etching was performed at various DC etch biases (0-500V) using a SiCl4 etch chemistry. The substrate etch rate dependence on applied bias was determined using mechanical profilometry. A distinct shift in the A3–A1 Si transition and significant spectral broadening of the room temperature PR spectra was observed as a function of etch bias. Photoreflectance results are correlated with RBS, SE and etch rate analysis. It is demonstrated that the PR spectra reflect a complex, competitive, plasma-surface interaction during the RIE process.


1994 ◽  
Vol 339 ◽  
Author(s):  
G. Popovici ◽  
T. Sung ◽  
M. A. Prelas ◽  
S. Khasawinah ◽  
R. G. Wilson

AbstractThe diffusion of oxygen, lithium, chlorine, and fluorine in CVD diamond films was performed under bias at 700 and 1000 °C. SIMS and Auger analyses were used to determine the impurity concentration. After diffusion, the concentrations of Li and O in the diamond films were found to be of the order of (3–4)×1019 cm-3. The fluorine concentration was of order of (l-2)×1017 cm-3. The conductivity was p-type. The change in the resistivity due to diffusion was nearly nine orders of magnitude for the sample diffused under electric field, and six orders of magnitude for the samples diffused without field. No dependence of the impurity concentration on the applied bias was observed except for fluorine. The fluorine concentration dependence on the electric field indicates that fluorine may have formed a shallow level in the diamond band gap. The fact that large concentrations of impurities can be diffused into diamond films at relatively low temperatures indicates the presence in the films of many lattice defects (including grain boundaries).


2011 ◽  
Vol 106 (3) ◽  
pp. 703-707
Author(s):  
T. Lin ◽  
L. Y. Shang ◽  
W. Z. Zhou ◽  
X. J. Meng ◽  
J. L. Sun ◽  
...  

1985 ◽  
Vol 60 ◽  
Author(s):  
G.P. Sykora ◽  
T.O. Mason

AbstractDefect studies at high defect content in transition metal monoxides allow for the conduction mechanisms to be established and the nature of defect interactions to be studied. Conductivity and thermopower results in p-type, highly defective MnO are reported and analyzed with a combination of point defects and clusters. A high pressure oxygen apparatus to achieve defect contents up to 5 percent in CoO has been designed and constructed.


2018 ◽  
Vol 924 ◽  
pp. 188-191 ◽  
Author(s):  
Hideharu Matsuura ◽  
Akinobu Takeshita ◽  
Tatsuya Imamura ◽  
Kota Takano ◽  
Kazuya Okuda ◽  
...  

The conduction mechanism in heavily Al-doped or heavily Al-and N-codoped p-type 4H-SiC epilayers was investigated. In both the singly-doped and codoped samples with an Al concentration (CAl) between 4x1019 and 2x1020 cm-3, band and nearest-neighbor hopping (NNH) conductions appeared in high and low temperature ranges, respectively. The codoping of N donors makes the NNH conduction dominant at temperatures higher than in the singly-doped samples. In both the singly-doped and codoped samples with CAl between 1x1019 and 4x1019 cm-3, an unexpected conduction appeared between the regions of the band and NNH conductions.


1976 ◽  
Vol 37 (11) ◽  
pp. 1347-1357 ◽  
Author(s):  
M. Averous ◽  
J. Calas ◽  
C. Fau ◽  
J. Bonnafe

Sign in / Sign up

Export Citation Format

Share Document