Metamorphic In0.3Ga0.7As/In0.29Al0.71As layer on GaAs: A new structure for high performance high electron mobility transistor realization

1992 ◽  
Vol 61 (8) ◽  
pp. 922-924 ◽  
Author(s):  
P. Win ◽  
Y. Druelle ◽  
A. Cappy ◽  
Y. Cordier ◽  
J. Favre ◽  
...  
2020 ◽  
Vol 829 ◽  
pp. 154542 ◽  
Author(s):  
Bing Ren ◽  
Meiyong Liao ◽  
Masatomo Sumiya ◽  
Jian Li ◽  
Lei Wang ◽  
...  

VLSI Design ◽  
2009 ◽  
Vol 2009 ◽  
pp. 1-9 ◽  
Author(s):  
Mohammad Javad Sharifi ◽  
Davoud Bahrepour

A new structure for an exclusive-OR (XOR) gate based on the resonant-tunneling high electron mobility transistor (RTHEMT) is introduced which comprises only an RTHEMT and two FETs. Calculations are done by utilizing a new subcircuit model for simulating the RTHEMT in the SPICE simulator. Details of the design, input, and output values and margins, delay of each transition, maximum operating frequency, static and dynamic power dissipations of the new structure are discussed and calculated and the performance is compared with other XOR gates which confirm that the presented structure has a high performance. Furthermore, to the best of authors' knowledge, it has the least component count in comparison to the existing structures.


2007 ◽  
Vol 46 (6A) ◽  
pp. 3385-3387 ◽  
Author(s):  
Chia-Yuan Chang ◽  
Edward Yi Chang ◽  
Yi-Chung Lien ◽  
Yasuyuki Miyamoto ◽  
Chien-I Kuo ◽  
...  

2014 ◽  
Vol 11 (3-4) ◽  
pp. 844-847 ◽  
Author(s):  
Raphael Brown ◽  
Abdullah Al-Khalidi ◽  
Douglas Macfarlane ◽  
Sanna Taking ◽  
Gary Ternent ◽  
...  

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