High-rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
2000 ◽
Vol 66
(10)
◽
pp. 1636-1640
2000 ◽
Vol 71
(8)
◽
pp. 3173-3177
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2004 ◽
Vol 70
(8)
◽
pp. 1075-1079
2003 ◽
Vol 444
(1-2)
◽
pp. 138-145
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2000 ◽
Vol 66
(6)
◽
pp. 907-911
2000 ◽
Vol 39
(Part 1, No. 11)
◽
pp. 6404-6409
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2006 ◽
Vol 45
(4B)
◽
pp. 3592-3597
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