Impact of the strained SiGe source/drain on hot carrier reliability for 45nm p-type metal-oxide-semiconductor field-effect transistors

2008 ◽  
Vol 92 (13) ◽  
pp. 133504 ◽  
Author(s):  
C. Y. Cheng ◽  
Y. K. Fang ◽  
J. C. Hsieh ◽  
H. Hsia ◽  
W. M. Chen ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Hot Carrier ◽  
P Type ◽  
Strained Sige

Impact of Ge Content on Flicker Noise Behavior of Strained-SiGe p-Type Metal–Oxide–Semiconductor Field-Effect Transistors

2009 ◽  
Vol 48 (4) ◽  
pp. 04C036 ◽  
Author(s):  
San-Lein Wu ◽  
Chung Yi Wu ◽  
Hau-Yu Lin ◽  
Cheng-Wen Kuo ◽  
Shin-Hsin Chen ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Flicker Noise ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
P Type ◽  
Strained Sige

Hot Carrier Degradations of Dynamic Threshold Silicon on Insulator p-Type Metal–Oxide–Semiconductor Field Effect Transistors

2004 ◽  
Vol 43 (4A) ◽  
pp. 1300-1304
Author(s):  
Tien-Sheng Chao ◽  
Yao-Jen Lee ◽  
Chun-Yang Huang ◽  
Horng-Chih Lin ◽  
Yiming Li ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Silicon On Insulator ◽  
Oxide Semiconductor ◽  
Dynamic Threshold ◽  
Hot Carrier ◽  
P Type

Selective Growth of B- and C-Doped SiGe Layers in Unprocessed and Recessed Si Openings for p-type Metal-Oxide-Semiconductor Field-Effect Transistors Application

2010 ◽  
Vol 157 (6) ◽  
pp. H633 ◽  
Author(s):  
M. Kolahdouz ◽  
P. Tabib Zadeh Adibi ◽  
A. Afshar Farniya ◽  
S. Shayestehaminzadeh ◽  
E. Trybom ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Selective Growth ◽  
Oxide Semiconductor ◽  
P Type
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