A kinetic model to study film deposition during dusty plasma chemical vapor deposition process
2010 ◽
Vol 21
(2)
◽
pp. 136-140
◽
1999 ◽
Vol 38
(Part 1, No. 7B)
◽
pp. 4550-4555
◽
2011 ◽
Vol 49
(4)
◽
pp. 313-320
2000 ◽
Vol 18
(3)
◽
pp. 900-906
◽
2013 ◽
Vol 25
(5)
◽
pp. 1283-1287
1989 ◽
Vol 50
(C5)
◽
pp. C5-667-C5-672