ANN-Model for Plasma Chemical Vapor Deposition Process
Keyword(s):
Plasma Chemical Vapor Deposition process is one of the main process to make optical fiber core-rod. In this process, gas flow, pressure, furnace temperature, reflective microwave power , resonator moving speed and deposition rate are dependant aspects. An artificial neural network model is set up to describe the relationship of variables in the process, and also verified by the experiment and production. Based on the ANN-model, the process recipe setting is illustrated in the paper.
2010 ◽
Vol 21
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pp. 136-140
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1999 ◽
Vol 38
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pp. 4550-4555
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Vol 18
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pp. 900-906
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Vol 49
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pp. 313-320
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pp. 1283-1287
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pp. C5-667-C5-672