Effects of Crossed Magnetic Fields on Silicon Particles in Plasma Chemical Vapor Deposition Process

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4550-4555 ◽  
Author(s):  
Hiroshi Fujiyama ◽  
Yoko Maemura ◽  
Mikio Ohtsu
Keyword(s):  
Chemical Vapor Deposition ◽  
Magnetic Fields ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Particles ◽  
Vapor Deposition Process

ANN-Model for Plasma Chemical Vapor Deposition Process

2013 ◽  
Vol 699 ◽  
pp. 92-95
Author(s):  
Zhen Yu Li ◽  
Hong Sheng Li
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Ann Model ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Process Gas ◽  
Vapor Deposition Process

Plasma Chemical Vapor Deposition process is one of the main process to make optical fiber core-rod. In this process, gas flow, pressure, furnace temperature, reflective microwave power , resonator moving speed and deposition rate are dependant aspects. An artificial neural network model is set up to describe the relationship of variables in the process, and also verified by the experiment and production. Based on the ANN-model, the process recipe setting is illustrated in the paper.

Highly Oriented ZnO Nanorod Arrays by a Novel Plasma Chemical Vapor Deposition Process

2010 ◽  
Vol 10 (4) ◽  
pp. 2011-2018 ◽  
Author(s):  
Daniela Bekermann ◽  
Alberto Gasparotto ◽  
Davide Barreca ◽  
Laura Bovo ◽  
Anjana Devi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Chemical Vapor Deposition Process ◽  
Zno Nanorod ◽  
Nanorod Arrays ◽  
Zno Nanorod Arrays ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition
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