Characteristics of silicon nitride deposited by plasma‐enhanced chemical vapor deposition using a dual frequency radio‐frequency source
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2008 ◽
Vol 14
(5)
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pp. 637-641
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2009 ◽
Vol 15
(5)
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pp. 881-885
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2006 ◽
Vol 596
(2)
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pp. 124-130
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2007 ◽
Vol 38
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pp. 148-151
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1990 ◽
Vol 29
(Part 1, No. 5)
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pp. 918-922
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