Effect of annealing temperature on structure and electrical properties of topological insulator Bi2Te3

2016 ◽  
Author(s):  
R. R. Urkude ◽  
U. A. Palikundwar
2013 ◽  
Vol 74 (12) ◽  
pp. 1672-1677 ◽  
Author(s):  
Y.J. Zhang ◽  
Z.T. Liu ◽  
D.Y. Zang ◽  
X.S. Che ◽  
L.P. Feng ◽  
...  

Author(s):  
I.H.H. Affendi ◽  
N. E. A. Azhar ◽  
M.S.P. Sarah ◽  
Salman A.H. Alrokayan ◽  
Haseeb A. Khan ◽  
...  

2018 ◽  
Vol 48 (2) ◽  
pp. 845-852 ◽  
Author(s):  
N. N. Wathore ◽  
Bhupender Rawal ◽  
Prashant Dixit ◽  
Snehal Mandave ◽  
B. Praveenkumar ◽  
...  

2001 ◽  
Vol 685 ◽  
Author(s):  
Won-Jae Lee ◽  
Chang-Ho Shin ◽  
In-Kyu You ◽  
Il-Suk Yang ◽  
Sang-Ouk Ryu ◽  
...  

AbstractThe SrTa2O6 (STO) thin films were prepared by plasma enhanced atomic layer deposition (PEALD) with alternating supply of reactant sources, Sr[Ta(C2H5O)5(C4H10NO)]2 {Strontium bis-[tantalum penta-ethoxide dimethyllaminoethoxide]; Sr(Ta(OEt)5▪dmae)2} and O2plasma. It was observed that the uniform and conformal STO thin films were successfully deposited using PEALD and the film thickness per cycle was saturated at about 0.8 nm at 300°C. Electrical properties of SrTa2O6 (STO) thin films prepared on Pt/SiO2/Si substrates with annealing temperatures have been investigated. While the grain size and dielectric constant of STO films increased with increasing annealing temperature, the leakage current characteristics of STO films slightly deteriorated. The leakage current density of a 40nm-STO film was about 5×10−8A/cm2 at 3V.


2007 ◽  
Vol 51 (1) ◽  
pp. 168 ◽  
Author(s):  
Dongwon Lee ◽  
Dongchan Suh ◽  
Dae-Hong Ko ◽  
Kyung Park ◽  
Myung Soo Lee ◽  
...  

2013 ◽  
Vol 854 ◽  
pp. 125-133 ◽  
Author(s):  
Larysa Khomenkova ◽  
Xavier Portier ◽  
Abdelilah Slaoui ◽  
Fabrice Gourbilleau

Hafnium silicate dielectric films were fabricated by radio frequency magnetron sputtering. Their microstructure and electrical properties were studied versus annealing treatment. The evolution of microstructure and the formation of alternated HfO2-rich and SiO2-rich layers were observed and explained by surface directed spinodal decomposition. The stable tetragonal HfO2 phase was formed upon an annealing at 1000-1100°C. The control of annealing temperature allowed the memory window to be achieved and to be tuned as well as the dielectric constant to be enhanced.


2013 ◽  
Vol 709 ◽  
pp. 172-175
Author(s):  
Li Lv ◽  
Min Zhang ◽  
Li Qin Yang ◽  
Xin Sheng Yang ◽  
Yong Zhao

Single crystals of Bi2Se3 topological insulators have been prepared though melt-grown reaction. The sintering parameters of holding time and cooling rate obviously affect the phase structure and electrical properties. The samples with layered structure can be perpendicular cleaved with (0 0 L) axis. All the samples show n-type conductivity caused by the existence of Se vacancies. For low cooling rate, more Se atoms anti-occupy Bi lattice sites, which decreases c-axis lattice parameter and increases carrier concentration n; high cooling rate increases c and decreases n because of less Se atoms occupying Bi lattice sites. Increasing holding time firstly decreases the ratio of Se atoms occupying Bi lattice sites and then increases it, which gives rise to c firstly increase then decrease and n firstly decrease then increase.


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