Surface reaction kinetics in atomic layer deposition: An analytical model and experiments

Journal of Applied Physics ◽

10.1063/1.5044456 ◽

2018 ◽

Vol 124 (9) ◽

pp. 095302 ◽

Author(s):

Triratna Muneshwar ◽

Ken Cadien

Keyword(s):

Atomic Layer Deposition ◽

Reaction Kinetics ◽

Analytical Model ◽

Surface Reaction ◽

Atomic Layer ◽

Layer Deposition ◽

Surface Reaction Kinetics

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Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.5b10529 ◽

2016 ◽

Vol 120 (8) ◽

pp. 4337-4344 ◽

Author(s):

Michael Reinke ◽

Yury Kuzminykh ◽

Patrik Hoffmann

Keyword(s):

Atomic Layer Deposition ◽

Reaction Kinetics ◽

Surface Reaction ◽

Atomic Layer ◽

Titanium Isopropoxide ◽

Layer Deposition ◽

Surface Reaction Kinetics ◽

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Surface reaction kinetics of metal β-diketonate precursors with O radicals in radical-enhanced atomic layer deposition of metal oxides

Applied Surface Science ◽

10.1016/j.apsusc.2004.11.025 ◽

2005 ◽

Vol 246 (1-3) ◽

pp. 250-261 ◽

Author(s):

Trinh T. Van ◽

Jane P. Chang

Keyword(s):

Atomic Layer Deposition ◽

Metal Oxides ◽

Reaction Kinetics ◽

Surface Reaction ◽

Atomic Layer ◽

Layer Deposition ◽

Surface Reaction Kinetics ◽

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Surface reaction kinetics of room temperature atomic layer deposition of ZnO observed by in situ IR absorption spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5079465 ◽

2019 ◽

Vol 37 (2) ◽

pp. 020922

Author(s):

Kazuki Yoshida ◽

Kentaro Saito ◽

Masanori Miura ◽

Kensaku Kanomata ◽

Fumihiko Hirose

Keyword(s):

Atomic Layer Deposition ◽

Room Temperature ◽

Surface Reaction ◽

Atomic Layer ◽

Ir Absorption ◽

Layer Deposition ◽

Surface Reaction Kinetics ◽

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Alternative Surface Reaction Route in the Atomic Layer Deposition of Titanium Nitride Thin Films for Electrode Applications

ACS Applied Electronic Materials ◽

10.1021/acsaelm.0c01079 ◽

2021 ◽

Vol 3 (2) ◽

pp. 999-1005

Author(s):

Hyeok Jae Lee ◽

Jin Ha Hwang ◽

Ji-Yong Park ◽

Sang Woon Lee

Keyword(s):

Atomic Layer Deposition ◽

Titanium Nitride ◽

Surface Reaction ◽

Atomic Layer ◽

Reaction Route ◽

Layer Deposition

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Analytical Model for Atomic-Layer Deposition of Thin Films on the Walls of Cylindrical Holes with a Relatively High Aspect Ratio

Technical Physics ◽

10.1134/s1063784218080054 ◽

2018 ◽

Vol 63 (8) ◽

pp. 1228-1235

Author(s):

A. V. Fadeev ◽

K. V. Rudenko

Keyword(s):

Aspect Ratio ◽

Atomic Layer Deposition ◽

Analytical Model ◽

High Aspect Ratio ◽

Atomic Layer ◽

Layer Deposition ◽

Cylindrical Holes

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Analytical Model of Atomic Layer Deposition of Films on 3D Structures with High Aspect Ratios

Technical Physics ◽

10.1134/s1063784218020123 ◽

2018 ◽

Vol 63 (2) ◽

pp. 235-242 ◽

Author(s):

A. V. Fadeev ◽

A. V. Myakon’kikh ◽

K. V. Rudenko

Keyword(s):

Atomic Layer Deposition ◽

Analytical Model ◽

Atomic Layer ◽

3D Structures ◽

Aspect Ratios ◽

Layer Deposition

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Surface reaction of silicon chlorides during atomic layer deposition of silicon nitride

Applied Surface Science ◽

10.1016/j.apsusc.2017.06.060 ◽

2018 ◽

Vol 432 ◽

pp. 127-131 ◽

Author(s):

Luchana L. Yusup ◽

Jae-Min Park ◽

Tirta R. Mayangsari ◽

Young-Kyun Kwon ◽

Won-Jun Lee

Keyword(s):

Silicon Nitride ◽

Atomic Layer Deposition ◽

Surface Reaction ◽

Atomic Layer ◽

Layer Deposition

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A Ballistic Transport and Surface Reaction Model for Simulating Atomic Layer Deposition Processes in High-Aspect-Ratio Nanopores

Chemical Vapor Deposition ◽

10.1002/cvde.201106922 ◽

2011 ◽

Vol 17 (10-12) ◽

pp. 353-365 ◽

Author(s):

Raymond A. Adomaitis

Keyword(s):

Aspect Ratio ◽

Atomic Layer Deposition ◽

High Aspect Ratio ◽

Surface Reaction ◽

Ballistic Transport ◽

Atomic Layer ◽

Reaction Model ◽

Layer Deposition ◽

Deposition Processes ◽

Surface Reaction Model

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Atomic layer deposition of Al2O3 on H-passivated Si. I. Initial surface reaction pathways with H/Si(100)-2×1

The Journal of Chemical Physics ◽

10.1063/1.1571513 ◽

2003 ◽

Vol 118 (22) ◽

pp. 10221-10226 ◽

Author(s):

Mathew D. Halls ◽

Krishnan Raghavachari

Keyword(s):

Atomic Layer Deposition ◽

Surface Reaction ◽

Atomic Layer ◽

Reaction Pathways ◽

Initial Surface ◽

Layer Deposition

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Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Isopropoxide and Ozone

ECS Meeting Abstracts ◽

10.1149/ma2008-01/21/775 ◽

2008 ◽

Keyword(s):

Titanium Dioxide ◽

Reaction Mechanism ◽

Atomic Layer Deposition ◽

Surface Reaction ◽

Atomic Layer ◽

Titanium Isopropoxide ◽

Layer Deposition ◽

Surface Reaction Mechanism

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