scholarly journals Apparent Anomalous Absorption and Image Matching

1969 ◽  
Vol 22 (5) ◽  
pp. 559 ◽  
Author(s):  
LM Clarebrough

Visual matching of experimental and theoretical electron micrographs can be used to determine the apparent anomalous absorption constant. The method has been applied to a copper-silicon (8 at. % Si) alloy by matching experimental and theoretical images of a Shockley partial dislocation and the main and subsidiary fringes of the associated stacking fault. The value of 0�067 which is obtained is considerably less than the value of 0�1 usually assumed for metals and alloys. In foils approximately 3611 thick details of the image are very sensitive to the value ofthe anomalous absorption constant and the value of 0�1 is inadequate for image matching. However, in foils approximately 6611thick the general topological features of an image are little altered by varying the anomalous absorption constant over a wide range and the approximate value of O� 1 is adequate for image matching.

2007 ◽  
Vol 105 (10) ◽  
pp. 1377-1383 ◽  
Author(s):  
Atsushi Mori ◽  
Yoshihisa Suzuki ◽  
Shin-Ichiro Yanagiya ◽  
Tsutomu Sawada ◽  
Kensaku Ito

2012 ◽  
Vol 725 ◽  
pp. 15-18 ◽  
Author(s):  
Isaho Kamata ◽  
Xuan Zhang ◽  
Hidekazu Tsuchida

Frank-type defects on a basal plane have been investigated using photoluminescence (PL) imaging microscopy and wavelength profile measurement. A wide range of emission in the near-infrared wavelength was observed from a Frank partial dislocation at the edge of the defect, while a narrow emission at around the visible light range was obtained from a stacking fault region. The emissions from a stacking fault region of three kinds of basal plane Frank-type defects were confirmed to have different wavelengths depending on their stacking structures.


1993 ◽  
Vol 319 ◽  
Author(s):  
H. Tanaka ◽  
Masao Doyama

AbstractDislocations were created near the center of the surface (101) of copper small crystals whose surfaces are (111), (111), (101), (101), (121), and (121) by use of n-body atom potentials and molecular dynamics. At first, a Heidenreich-Shockley partial dislocation was created., As the partial dislocation proceeds, the partial dislocation and the surface was connected with a stacking fault until the next Heidenreich-Shockley partial dislocation was created at the surface.Just before the creation of a partial dislocation the stress was the highest.


1993 ◽  
Vol 319 ◽  
Author(s):  
H. Tanaka ◽  
Masao Doyama

AbstractDislocations were created near the center of the surface (101) of copper small crystals whose surfaces are (111), (111), (101), (101), (121), and (121) by use of n-body atom potentials and molecular dynamics. At first, a Heidenreich-Shockley partial dislocation was created., As the partial dislocation proceeds, the partial dislocation and the surface was connected with a stacking fault until the next Heidenreich-Shockley partial dislocation was created at the surface.Just before the creation of a partial dislocation the stress was the highest.


1997 ◽  
Vol 505 ◽  
Author(s):  
Masaodoyama ◽  
Yoshiaki Kogure ◽  
Tadatoshi Nozaki

ABSTRACTDislocations were created near the center of the surface (110) of copper small crystals whose surfaces are (111), (111), (110), (110), (112), and (112) by use of n-body atom potentials and molecular dynamics. At first, a Heidenreich-Shockley partial dislocation was created. As the partial dislocation proceeds, the partial dislocation and the surface was connected with a stacking fault until the next Heidenreich-Shockley partial dislocation was created at the surface.Just before the creation of a partial dislocation the stress was the highest. For larger crystals, forming a step on (110) plane was not enough and a shear was necessary to move dislocations.


2015 ◽  
Vol 2015 ◽  
pp. 1-12 ◽  
Author(s):  
Ehab A. El-Danaf ◽  
Mahmoud S. Soliman ◽  
Ayman A. Al-Mutlaq

The effect of grain size and stacking fault energy (SFE) on the strain hardening rate behavior under plane strain compression (PSC) is investigated for pure Cu and binary Cu-Al alloys containing 1, 2, 4.7, and 7 wt. % Al. The alloys studied have a wide range of SFE from a low SFE of 4.5 mJm−2for Cu-7Al to a medium SFE of 78 mJm−2for pure Cu. A series of PSC tests have been conducted on these alloys for three average grain sizes of ~15, 70, and 250 μm. Strain hardening rate curves were obtained and a criterion relating twinning stress to grain size is established. It is concluded that the stress required for twinning initiation decreases with increasing grain size. Low values of SFE have an indirect influence on twinning stress by increasing the strain hardening rate which is reflected in building up the critical dislocation density needed to initiate mechanical twinning. A study on the effect of grain size on the intensity of the brass texture component for the low SFE alloys has revealed the reduction of the orientation density of that component with increasing grain size.


2019 ◽  
Vol 11 (22) ◽  
pp. 20521-20527 ◽  
Author(s):  
Zhonghui Han ◽  
Weizhao Hong ◽  
Weinan Xing ◽  
Yidong Hu ◽  
Yansong Zhou ◽  
...  

1990 ◽  
Vol 213 ◽  
Author(s):  
B.J. Pestman ◽  
J. Th. M. De Hosson ◽  
V. Vitek ◽  
F.W. Schapink

ABSTRACTThe interaction of 1/2<1 1 0> screw dislocations with symmetric [1 1 0] tilt boundaries was investigated by atomistic simulations using many-body potentials representing ordered compounds. The calculations were performed with and without an applied shear stress. The observations were: absorption into the grain boundary, attraction of a lattice Shockley partial dislocation towards the grain boundary and transmission through the grain boundary under the influence of a shear stress. It was found that the interaction in ordered compounds shows similarities to the interaction in fcc.


2018 ◽  
Vol 123 (16) ◽  
pp. 161580 ◽  
Author(s):  
Yoshifumi Yamashita ◽  
Ryu Nakata ◽  
Takeshi Nishikawa ◽  
Masaki Hada ◽  
Yasuhiko Hayashi

2014 ◽  
Vol 115 (4) ◽  
pp. 043532 ◽  
Author(s):  
Chao-Ying Wang ◽  
Li-Jun Yang ◽  
Wei Zhao ◽  
Qing-Yuan Meng ◽  
Chen-liang Li ◽  
...  

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