Study on the rapid thermal annealing process of low-energy arsenic and phosphorous ion-implanted silicon by reflective second harmonic generation
2005 ◽
Vol 38
(21)
◽
pp. 3926-3933
◽
2004 ◽
Vol 17
(1)
◽
pp. 7-15
2010 ◽
Vol 13
(8)
◽
pp. J92
◽
1992 ◽
Vol 220
(1-2)
◽
pp. 106-110
◽
2015 ◽
Vol 10
(4)
◽
pp. 471-474