Depth profiling of vacancy defects and their thermal stability in N-implanted Si: a positron annihilation study
2010 ◽
Vol 43
(32)
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pp. 325401
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Keyword(s):
2018 ◽
Vol 53
(18)
◽
pp. 12961-12973
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1996 ◽
Vol 47
(3)
◽
pp. 399-403
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Keyword(s):