Electrical Characterization of Metal–Insulator–Metal Capacitors with Atomic-Layer-Deposited HfO 2 Dielectrics for Radio Frequency Integrated Circuit Application

Chinese Physics Letters ◽

10.1088/0256-307x/24/10/063 ◽

2007 ◽

Vol 24 (10) ◽

pp. 2942-2944 ◽

Author(s):

Huang Yu-Jian ◽

Huang Yue ◽

Ding Shi-Jin ◽

Zhang Wei ◽

Liu Ran

Keyword(s):

Radio Frequency ◽

Integrated Circuit ◽

Electrical Characterization ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Metal

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Comparative study and characterization of atomic layer deposition Al2O3 films as metal-insulator-metal capacitor dielectric for GaAs hetero-junction bipolar transistor technology

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5112773 ◽

2019 ◽

Vol 37 (5) ◽

pp. 050903

Author(s):

Jiro Yota ◽

Mehran Janani ◽

Hal M. Banbrook ◽

Patrick Rabinzohn ◽

Markus Bosund

Keyword(s):

Atomic Layer Deposition ◽

Comparative Study ◽

Atomic Layer ◽

Bipolar Transistor ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal ◽

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Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al[sub 2]O[sub 3] and ZnO for Transparent Thin Film Transistor Applications

Journal of The Electrochemical Society ◽

10.1149/1.3421680 ◽

2010 ◽

Vol 157 (7) ◽

pp. H727 ◽

Author(s):

Sung-Min Yoon ◽

Sang-Hee Ko Park ◽

Chun-Won Byun ◽

Shin-Hyuk Yang ◽

Chi-Sun Hwang

Keyword(s):

Thin Film ◽

Thin Film Transistor ◽

Electrical Characterization ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Transparent Thin Film Transistor

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Physical and Electrical Characterization of Metal–Insulator–Metal Capacitors With $\hbox{Sm}_{2}\hbox{O}_{3}$ and $\hbox{Sm}_{2}\hbox{O}_{3}/\hbox{SiO}_{2}$ Laminated Dielectrics for Analog Circuit Applications

IEEE Transactions on Electron Devices ◽

10.1109/ted.2009.2030539 ◽

2009 ◽

Vol 56 (11) ◽

pp. 2683-2691 ◽

Author(s):

Jing-De Chen ◽

Jian-Jun Yang ◽

Rick Wise ◽

Philipp Steinmann ◽

Ming-Bin Yu ◽

...

Keyword(s):

Analog Circuit ◽

Electrical Characterization ◽

Metal Insulator ◽

Metal Insulator Metal

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Electrical characterization of a-C:H as a dielectric material in metal/insulator/metal structures

physica status solidi (c) ◽

10.1002/pssc.200982794 ◽

2010 ◽

pp. NA-NA

Author(s):

C. Zúñiga-I. ◽

A. Kosarev ◽

A. Torres-J. ◽

P. Rosales-Q. ◽

W. Calleja-A. ◽

...

Keyword(s):

Dielectric Material ◽

Electrical Characterization ◽

Metal Insulator ◽

Metal Structures ◽

Metal Insulator Metal

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In vacuo atomic layer deposition and electron tunneling characterization of ultrathin dielectric films for metal/insulator/metal tunnel junctions

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5141078 ◽

2020 ◽

Vol 38 (4) ◽

pp. 040802 ◽

Author(s):

Judy Z. Wu ◽

Jagaran Acharya ◽

Ryan Goul

Keyword(s):

Atomic Layer Deposition ◽

Tunnel Junctions ◽

Electron Tunneling ◽

Atomic Layer ◽

Dielectric Films ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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DC to radio-frequency characterization of ZrO2 dielectric for “Metal-Insulator-Metal” integrated capacitors

2009 Asia Pacific Microwave Conference ◽

10.1109/apmc.2009.5384500 ◽

2009 ◽

Author(s):

T. Bertaud ◽

C. Vallee ◽

C. Bermond ◽

T. Lacrevaz ◽

B. Flechet ◽

...

Keyword(s):

Radio Frequency ◽

Metal Insulator ◽

Metal Insulator Metal

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Physical and electrical characterization of HfO2 metal–insulator–metal capacitors for Si analog circuit applications

Journal of Applied Physics ◽

10.1063/1.1579550 ◽

2003 ◽

Vol 94 (1) ◽

pp. 551-557 ◽

Author(s):

Hang Hu ◽

Chunxiang Zhu ◽

Y. F. Lu ◽

Y. H. Wu ◽

T. Liew ◽

...

Keyword(s):

Analog Circuit ◽

Electrical Characterization ◽

Metal Insulator ◽

Metal Insulator Metal

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Structural and Electrical Characterization of Lu2O3Dielectric Layer for High Performance Analog Metal–Insulator–Metal Capacitors

Journal of The Electrochemical Society ◽

10.1149/2.086206jes ◽

2012 ◽

Vol 159 (6) ◽

pp. H589-H594 ◽

Author(s):

Somnath Mondal ◽

Jim-Long Her ◽

Shao-Ju Shih ◽

Tung-Ming Pan

Keyword(s):

High Performance ◽

Electrical Characterization ◽

Metal Insulator ◽

Metal Insulator Metal

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TiN∕Ta2O5∕PE–SiN∕TiN metal-insulator-metal capacitor for radio frequency and mixed signal integrated circuit applications

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1864055 ◽

2005 ◽

Vol 23 (4) ◽

pp. 764-767 ◽

Author(s):

Y. S. Chung ◽

K. S. Kim ◽

Y. S. Ryu ◽

D. Lee ◽

S. B. Hwang ◽

...

Keyword(s):

Radio Frequency ◽

Integrated Circuit ◽

Metal Insulator ◽

Mixed Signal ◽

Metal Insulator Metal ◽

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Characterization of atomic layer deposition HfO2, Al2O3, and plasma-enhanced chemical vapor deposition Si3N4 as metal–insulator–metal capacitor dielectric for GaAs HBT technology

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4769207 ◽

2013 ◽

Vol 31 (1) ◽

pp. 01A134 ◽

Author(s):

Jiro Yota ◽

Hong Shen ◽

Ravi Ramanathan

Keyword(s):

Chemical Vapor Deposition ◽

Atomic Layer Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Atomic Layer ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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