A highly stable temperature sensor based on Au/Cu/n-Si Schottky barrier diodes depending on the inner metal thickness

Author(s):  
Hasan Efeoglu ◽  
Abdulmecit Turut

Abstract We have fabricated the Au/n-Si (D1), Au/Cu/n-Si (D2), Au/Cu(4nm)/n-Si (D3) and Au/Cu(2nm)/n-Si (D4) Schottky-barrier diodes (SBDs). The thickness of the Cu Schottky contact (SC) films for the D2, D3, and D4 diodes has been chosen as 100, 4 and 2 nm, respectively. We have investigated the thermal sensitivity from the voltage-temperature (V-T) characteristics of the SBDs at different current levels. The V-T measurements have been made in the temperature range from 10 K to 320 K with steps of 2 K, at the different current levels from 50 nA to 141.70 µA. The V-T curves have shown a good linearity degree for all SBDs. The slope dV/dT = α or thermal sensitivity coefficient α for each diode has decreased with increasing current level from 50 nA to 141.70 µA. But, it has been seen that the SBDs with the Cu SC have approximately the same α value as independent of metal thickness at the same current level. That is, the thermal sensitivity coefficient value has changed approximately from 2.48 mV/K at 50 nA to 1.82 at 141.70 µA for the SBDs with Cu Schottky contact as independent metal thickness. Furthermore, the α versus current level plots of the diodes have exhibited a linear behavior. The intercept α0 and slope dα/dI values of the α versus current level plots have been obtained as 2.80 mV/K and -0.0843 mV/(AK) for D2, and 2.85 mV/K and -0.092 mV/(AK) for D3 and 2.83 mV/K and -0.0876 mV/(AK) for D4. These values are very close to each other and the difference between the slope (dα/dI) values is small enough to be neglected.

2006 ◽  
Vol 527-529 ◽  
pp. 927-930 ◽  
Author(s):  
Tomonori Nakamura ◽  
Toshiyuki Miyanagi ◽  
Isaho Kamata ◽  
Hidekazu Tsuchida

We compared the electrical characteristics of 4H-SiC(0001) and (000-1) Schottky barrier diodes (SBDs), and derived the Schottky barrier heights (Hbs) of Ta, W, Mo, and Pd on {0001}. We investigated the annealing temperature dependence of Hbs in Mo and the W Schottky contacts for (0001) and (000-1). The Hbs are increased by annealing, except for the W Schottky contact on (0001). The yields of 0.25 cm2 as-deposited Mo-SBDs were 93.3% for (0001) and 71.1% for (000-1), respectively. We also demonstrated over 1 cm2 (0001) as-deposited Mo-SBD with a low leakage current, an excellent ideality factor, and no excess current, encouraging the enlargement of the active area in the SBD.


2021 ◽  
Vol 21 (3) ◽  
pp. 2001-2004
Author(s):  
Seong-Ji Min ◽  
Michael A. Schweitz ◽  
Ngoc Thi Nguyen ◽  
Sang-Mo Koo

We present a comparison between the thermal sensing behaviors of 4H-SiC Schottky barrier diodes, junction barrier Schottky diodes, and PiN diodes in a temperature range from 293 K to 573 K. The thermal sensitivity of the devices was calculated from the slope of the forward voltage versus temperature plot. At a forward current of 10 μA, the PiN diode presented the highest sensitivity peak (4.11 mV K−1), compared to the peaks of the junction barrier Schottky diode and the Schottky barrier diode (2.1 mV K−1 and 1.9 mV K−1, respectively). The minimum temperature errors of the PiN and junction barrier Schottky diodes were 0.365 K and 0.565 K, respectively, for a forward current of 80 μA±10 μA. The corresponding value for the Schottky barrier diode was 0.985 K for a forward current of 150 μA±10 μA. In contrast to Schottky diodes, the PiN diode presents a lower increase in saturation current with temperature. Therefore, the nonlinear contribution of the saturation current with respect to the forward current is negligible; this contributes to the higher sensitivity of the PiN diode, allowing for the design and fabrication of highly linear sensors that can operate in a wider temperature range than the other two diode types.


2019 ◽  
Vol 7 (35) ◽  
pp. 10953-10960 ◽  
Author(s):  
Hojoong Kim ◽  
Sinsu Kyoung ◽  
Taiyoung Kang ◽  
Jang-Yeon Kwon ◽  
Kyung Hwan Kim ◽  
...  

β-Ga2O3Schottky barrier diodes (SBDs) were demonstrated with Ni Schottky contact deposited by the confined magnetic field-based sputtering (CMFS) method.


2020 ◽  
Vol 1004 ◽  
pp. 960-972
Author(s):  
Mehadi Hasan Ziko ◽  
Ants Koel ◽  
Toomas Rang ◽  
Jana Toompuu

The diffusion welding (DW), known as direct bonding technique could be more used as an alternative approach to develop silicon carbide (SiC) Schottky rectifiers to existing mainstream metallization contact technologies. Measured results for p-type 4H-SiC Schottky barrier diodes (SBD) arepresented. And comprehensive numerical study to characterize the device has been performed. The simulations are carried out with ATLAS software (Silvaco). The measured and numerically simulated forward current-voltage (I–V) and capacitance-voltage (C–V) characteristics in a large temperaturerange are analyzed. Some of the measured p-type 4H-SiC Schottky diodes show deviation in specific ranges of their electrical characteristics. This deviation, especially due to excess current, dominates at low voltages (less than 1 V) and temperatures (less than room temperature). To verify the existence of electrically active defects under the Schottky contact, which influences the Schottky barrier height (SBH) and its inhomogeneity, the deep level transient spectroscopy (DLTS) technology was applied. DLTS measurements show the presence of a deep-level defect with activation energy corresponding typically for multilevel trap clusters.


2012 ◽  
Author(s):  
O. Seok ◽  
W. Ahn ◽  
Y. Kim ◽  
M. Ha ◽  
M. Han

Electronics ◽  
2021 ◽  
Vol 10 (22) ◽  
pp. 2802
Author(s):  
Egor Polyntsev ◽  
Evgeny Erofeev ◽  
Igor Yunusov

In this paper, lateral AlGaN/GaN Schottky barrier diodes are investigated in terms of anode construction and diode structure. An original GaN Schottky diode manufacturing-process flow was developed. A set of experiments was carried out to verify dependences between electrical parameters of the diode, such as reverse and forward currents, ON-state voltage, forward voltage and capacitance, anode-to-cathode distance, length of field plate, anode length, Schottky contact material, subanode recess depth, and epitaxial structure type. It was found that diodes of SiN/Al0.23Ga0.77N/GaN epi structure with Ni-based anodes demonstrated two orders of magnitude lower reverse currents than diodes with GaN/Al0.25Ga0.75N/GaN epitaxial structure. Diodes with Ni-based anodes demonstrated lower VON and higher IF compared with diodes with Pt-based anodes. As a result of these investigations, an optimal set of parameters was selected, providing the following electrical characteristics: VON = 0.6 (at IF = 1 mA/mm), forward voltage of the diode VF = 1.6 V (at IF = 100 mA/mm), maximum reverse voltage VR = 300 V, reverse leakage current IR = 0.04 μA/mm (at VR = −200 V), and total capacitance C = 3.6 pF/mm (at f = 1 MHz and 0 V DC bias). Obtained electrical characteristics of the lateral Schottky barrier diode demonstrate great potential for use in energy-efficient power applications, such as 5G multiband and multistandard wireless base stations.


2007 ◽  
Vol 4 (5) ◽  
pp. 1625-1628 ◽  
Author(s):  
P. C. Chang ◽  
C. L. Yu ◽  
C. H. Liu ◽  
S. J. Chang ◽  
Y. K. Su ◽  
...  

2016 ◽  
Vol 136 (4) ◽  
pp. 479-483
Author(s):  
Masataka Higashiwaki ◽  
Kohei Sasaki ◽  
Hisashi Murakami ◽  
Yoshinao Kumagai ◽  
Akito Kuramata

2020 ◽  
Vol 13 (9) ◽  
pp. 096502
Author(s):  
Yu Lu ◽  
Feng Zhou ◽  
Weizong Xu ◽  
Dongsheng Wang ◽  
Yuanyang Xia ◽  
...  

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