Ion energy control via the electrical asymmetry effect to tune coating properties in reactive radio frequency sputtering

Plasma Sources Science and Technology ◽

10.1088/1361-6595/ab504b ◽

2019 ◽

Vol 28 (11) ◽

pp. 114001 ◽

Author(s):

Stefan Ries ◽

Lars Banko ◽

Marcus Hans ◽

Daniel Primetzhofer ◽

Jochen M Schneider ◽

...

Keyword(s):

Radio Frequency ◽

Coating Properties ◽

Energy Control ◽

Asymmetry Effect ◽

Radio Frequency Sputtering

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The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/42/9/092005 ◽

2009 ◽

Vol 42 (9) ◽

pp. 092005 ◽

Author(s):

J Schulze ◽

E Schüngel ◽

U Czarnetzki

Keyword(s):

Radio Frequency ◽

Ion Flux ◽

Asymmetry Effect ◽

Capacitively Coupled ◽

Self Bias ◽

Radio Frequency Discharges

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Thermoelectric properties of Al1−xInxN and Al1−y−zGayInzN prepared by radio-frequency sputtering: Toward a thermoelectric power device

Applied Physics Letters ◽

10.1063/1.1560560 ◽

2003 ◽

Vol 82 (13) ◽

pp. 2065-2067 ◽

Author(s):

Shigeo Yamaguchi ◽

Yasuo Iwamura ◽

Atsushi Yamamoto

Keyword(s):

Radio Frequency ◽

Thermoelectric Power ◽

Thermoelectric Properties ◽

Power Device ◽

Radio Frequency Sputtering

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Radio frequency sputtering—the significance of power input

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.572218 ◽

1983 ◽

Vol 1 (4) ◽

pp. 1795-1800 ◽

Author(s):

Chris M. Horwitz

Keyword(s):

Radio Frequency ◽

Power Input ◽

Radio Frequency Sputtering

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Magnetron radio frequency sputtering growth of LaNi5 thin films and their hydrogen-sensitive properties at room temperature and ordinary pressure

Applied Surface Science ◽

10.1016/j.apsusc.2015.01.051 ◽

2015 ◽

Vol 331 ◽

pp. 35-40 ◽

Author(s):

Han Tian ◽

Kansong Chen ◽

Huarong Liu ◽

Kun Xie ◽

Haoshuang Gu

Keyword(s):

Radio Frequency ◽

Room Temperature ◽

Radio Frequency Sputtering

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Annealing Effects on Cathodoluminescence Properties of SiOxFilms Deposited by Radio Frequency Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.01bf04 ◽

2011 ◽

Vol 50 ◽

pp. 01BF04 ◽

Author(s):

Ahmed Mohamed Ahmed Abd El-Razek Shamekh ◽

Norio Tokuda ◽

Takao Inokuma

Keyword(s):

Radio Frequency ◽

Radio Frequency Sputtering ◽

Annealing Effects

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Impact of radio frequency source power-induced ion energy on a refractive index of SiN film deposited by a pulsed-PECVD at room temperature

Thin Solid Films ◽

10.1016/j.tsf.2010.04.007 ◽

2010 ◽

Vol 518 (22) ◽

pp. 6554-6557 ◽

Author(s):

Suyeon Kim ◽

Byungwhan Kim

Keyword(s):

Refractive Index ◽

Radio Frequency ◽

Room Temperature ◽

Source Power ◽

Frequency Source

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Ion energy distribution in a radio frequency sheath of plasma with Kappa electron velocity distribution

Contributions to Plasma Physics ◽

10.1002/ctpp.202000108 ◽

2020 ◽

Vol 61 (2) ◽

Author(s):

Jing Ou ◽

Yueheng Huang

Keyword(s):

Energy Distribution ◽

Radio Frequency ◽

Velocity Distribution ◽

Electron Velocity ◽

Electron Velocity Distribution ◽

Ion Energy Distribution

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Specific features of the formation of Ba x Sr1 − x TiO3 ferroelectric thin films on different substrates by radio-frequency sputtering

Physics of the Solid State ◽

10.1134/s1063783409070026 ◽

2009 ◽

Vol 51 (7) ◽

pp. 1328-1331 ◽

Author(s):

M. S. Ivanov ◽

M. S. Afanas’ev

Keyword(s):

Radio Frequency ◽

Ferroelectric Thin Films ◽

Radio Frequency Sputtering

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Influence of the Composition of the Radio-Frequency Sputtering Atmosphere on the Density of States and Interband Light Absorption in thin Y2O3 Films

Journal of Applied Spectroscopy ◽

10.1007/s10812-022-01292-x ◽

2022 ◽

Author(s):

O. M. Bordun ◽

B. O. Bordun ◽

I. M. Kofliuk ◽

I. Yo. Kukharskyy ◽

I. I. Medvid

Keyword(s):

Radio Frequency ◽

Density Of States ◽

Light Absorption ◽

Radio Frequency Sputtering ◽

Interband Light Absorption

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Fabrication of Blue-Light Emitting Tantalum Oxide Films by Radio-Frequency Sputtering

2008 IEEE PhotonicsGlobal@Singapore ◽

10.1109/ipgc.2008.4781359 ◽

2008 ◽

Author(s):

K. Miura ◽

H. Miyazaki ◽

O. Hanaizumi

Keyword(s):

Radio Frequency ◽

Tantalum Oxide ◽

Oxide Films ◽

Light Emitting ◽

Radio Frequency Sputtering

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