Magneto-optical characterization of ZnO / Ni nano-laminate obtained via Atomic Layer Deposition

Journal of Physics Conference Series ◽

10.1088/1742-6596/1762/1/012041 ◽

2021 ◽

Vol 1762 (1) ◽

pp. 012041

Author(s):

K Buchkov ◽

A Galluzzi ◽

B Blagoev ◽

A Paskaleva ◽

P Terziyska ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Optical Characterization ◽

Layer Deposition

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Optical characterization of type-II ZnO/ZnS multiple quantum wells grown by atomic layer deposition

Thin Solid Films ◽

10.1016/j.tsf.2019.137740 ◽

2020 ◽

Vol 694 ◽

pp. 137740 ◽

Author(s):

Mostafa Afifi Hassan ◽

Aadil Waseem ◽

Muhammad Ali Johar ◽

Sou Young Yu ◽

June Key Lee ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Quantum Wells ◽

Atomic Layer ◽

Optical Characterization ◽

Multiple Quantum Wells ◽

Multiple Quantum ◽

Type Ii ◽

Layer Deposition

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Morphological, structural and optical characterization of SnO2 nanotube arrays fabricated using anodic alumina (AAO) template-assisted atomic layer deposition

Materials Characterization ◽

10.1016/j.matchar.2017.12.009 ◽

2018 ◽

Vol 136 ◽

pp. 52-59 ◽

Author(s):

Małgorzata Norek ◽

Matti Putkonen ◽

Wojciech Zaleszczyk ◽

Bogusław Budner ◽

Zbigniew Bojar

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Optical Characterization ◽

Anodic Alumina ◽

Nanotube Arrays ◽

Aao Template ◽

Layer Deposition ◽

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Optical characterization of nanocrystalline boron nitride thin films grown by atomic layer deposition

Thin Solid Films ◽

10.1016/j.tsf.2014.09.065 ◽

2014 ◽

Vol 571 ◽

pp. 51-55 ◽

Author(s):

Michael Snure ◽

Qing Paduano ◽

Merle Hamilton ◽

Jodie Shoaf ◽

J. Matthew Mann

Keyword(s):

Boron Nitride ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Optical Characterization ◽

Layer Deposition

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Structural, electrical and optical characterization of Ti-doped ZnO films grown by atomic layer deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2014.07.177 ◽

2014 ◽

Vol 616 ◽

pp. 618-624 ◽

Author(s):

Kristin Bergum ◽

Per-Anders Hansen ◽

Helmer Fjellvåg ◽

Ola Nilsen

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Optical Characterization ◽

Zno Films ◽

Layer Deposition ◽

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Optical characterization of HfO2 thin films grown by atomic layer deposition

Thin Solid Films ◽

10.1016/j.tsf.2004.01.110 ◽

2004 ◽

Vol 466 (1-2) ◽

pp. 41-47 ◽

Author(s):

Jaan Aarik ◽

Hugo Mändar ◽

Marco Kirm ◽

Lembit Pung

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Optical Characterization ◽

Layer Deposition

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Characterization of HfO2/Al2O3 gate dielectric nanometer-stacks grown by atomic layer deposition on InAlAs substrates

2016 13th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT) ◽

10.1109/icsict.2016.7998624 ◽

2016 ◽

Author(s):

Li-Fan Wu ◽

Yu-Ming Zhang ◽

Hong-Liang Lu ◽

Yi-Men Zhang

Keyword(s):

Atomic Layer Deposition ◽

Gate Dielectric ◽

Atomic Layer ◽

Layer Deposition ◽

Al2o3 Gate Dielectric

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Atomic Layer Deposition and in-Situ Characterization of Yttrium Oxide and Yttria-Stabilized Zirconia

ECS Transactions ◽

10.1149/06907.0109ecst ◽

2015 ◽

Vol 69 (7) ◽

pp. 109-116

Author(s):

L. Lecordier

Keyword(s):

Atomic Layer Deposition ◽

Yttrium Oxide ◽

Atomic Layer ◽

Yttria Stabilized Zirconia ◽

Stabilized Zirconia ◽

In Situ Characterization ◽

Layer Deposition

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Spectroscopic characterization of ZrO2 thin films grown by atomic layer deposition

Proceedings of the Estonian Academy of Sciences. Physics. Mathematics ◽

10.3176/phys.math.2003.3.05 ◽

2003 ◽

Vol 52 (3) ◽

pp. 289

Author(s):

J Aarik ◽

M Kirm ◽

H Mändar

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Spectroscopic Characterization ◽

Layer Deposition

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Interface trap characterization of atomic layer deposition Al2O3/GaN metal-insulator-semiconductor capacitors using optically and thermally based deep level spectroscopies

Journal of Applied Physics ◽

10.1063/1.4808093 ◽

2013 ◽

Vol 113 (20) ◽

pp. 204505 ◽

Author(s):

Christine M. Jackson ◽

Aaron R. Arehart ◽

Emre Cinkilic ◽

Brian McSkimming ◽

James S. Speck ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Interface Trap ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Layer Deposition

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Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

Dalton Transactions ◽

10.1039/c6dt03952a ◽

2017 ◽

Vol 46 (4) ◽

pp. 1172-1178 ◽

Author(s):

T. Jurca ◽

A. W. Peters ◽

A. R. Mouat ◽

O. K. Farha ◽

J. T. Hupp ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Second Generation ◽

Atomic Layer ◽

Synthesis And Characterization ◽

Layer Deposition

The synthesis and characterization of molybdenum oxo-amidinate ALD precursors MoO2(R2AMD)2[AMD =N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) andiPr (3)] is reported.

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