Computer simulation of a power source based on a bipolar pulse shaper for magnetron sputtering systems
Abstract The research object is a pulsed bipolar power supply based on a bipolar pulse shaper of increased frequency for magnetron sputtering systems. The research subject is the electrophysical and electromagnetic processes occurring in the bipolar pulse shaper when it is operated with a magnetron sputtering system, as well as the control characteristics. The purpose of the paper is the possibility of creating a pulsed power supply with a power of up to several tens of kW, which makes it possible to increase the stability of the magnetron sputtering system. Besides, the outcomes of computer simulation of a power source based on a bipolar pulse shaper and control algorithm ensuring its stable and reliable operation in association with a magnetron sputtering system are reflected in the paper. The results show that the deviation of the output control characteristics of the bipolar pulse shaper from the analytically obtained characteristics does not exceed 3%. Circuit modeling is carried out in the Swicher CAD/LTspice software package. The mathematical SPICE models of the field-effect STY112N65M5 transistor, transistor IGBT of IRF4PF50WD and STTH8006 diode are taken from the websites of STMicroelectronics and International Rectifier manufacturers.