Degradation caused by Negative Bias temperature instability depending on Body Bias on NMOS or PMOS in 65 nm bulk and thin-BOX FDSOI processes
2016 ◽
2019 ◽
Vol 11
(4)
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pp. 04018-1-04018-6
2008 ◽
Vol 55
(7)
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pp. 1630-1638
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