Graphene based field effect transistors for novel nonvolatile memories

Author(s):  
Jia-Hui Xie ◽  
Youwei Zhang ◽  
Qiyuan Wang ◽  
Laigui Hu ◽  
Pengfei Tian ◽  
...  
2021 ◽  
Vol 33 (14) ◽  
pp. 2007965
Author(s):  
Marco Carroli ◽  
Alex G. Dixon ◽  
Martin Herder ◽  
Egon Pavlica ◽  
Stefan Hecht ◽  
...  

2017 ◽  
Vol 26 (03) ◽  
pp. 1740015
Author(s):  
Jun Kondo ◽  
Murali Lingalugari ◽  
Pial Mirdha ◽  
Pik-Yiu Chan ◽  
Evan Heller ◽  
...  

This paper presents quantum dot channel (QDC) Field Effect Transistors (FETs) which are configured as nonvolatile memories (NVMs) by incorporating cladded GeOx-Ge quantum dots in the floating gates as well as the transport channels. The current flow and the threshold characteristics were significantly improved when the gate dielectric was changed from silicon dioxide (SiO2) to hafnium aluminum oxide (HfAlO2), and the control dielectric was changed from silicon nitride (Si3N4) to hafnium aluminum oxide (HfAlO2). The device operations are explained by carrier transport in narrow energy mini-bands which are manifested in a quantum dot transport channel.


2005 ◽  
Vol 87 (20) ◽  
pp. 203509 ◽  
Author(s):  
R. C. G. Naber ◽  
B. de Boer ◽  
P. W. M. Blom ◽  
D. M. de Leeuw

2008 ◽  
Author(s):  
Takafumi Uemura ◽  
Masakazu Yamagishi ◽  
Yukihiro Tominari ◽  
Jun Takeya

2008 ◽  
Author(s):  
M. Uno ◽  
I. Doi ◽  
K. Takimiya ◽  
Jun Takeya

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