Zero-bias Schottky diode based THz detectors at room temperature using metallic nanowire

2016 ◽  
Author(s):  
Ahid S. Hajo ◽  
Shihab Al-Daffaie ◽  
Oktay Yilmazoglu ◽  
Mohammad Tanvir Haidar ◽  
Franko Kuppers
Keyword(s):  
Schottky Diode ◽  
Room Temperature ◽  
Zero Bias ◽  
Thz Detectors

Study on Schottky Diode Characteristics Improving by X-Ray Irradiation

2013 ◽  
Vol 717 ◽  
pp. 113-116
Author(s):  
Sani Klinsanit ◽  
Itsara Srithanachai ◽  
Surada Ueamanapong ◽  
Sunya Khunkhao ◽  
Budsara Nararug ◽  
...  
Keyword(s):  
Leakage Current ◽  
Schottky Diode ◽  
Room Temperature ◽  
The Other ◽  
Low Power Consumption ◽  
Initial Value ◽  
X Ray ◽  
Forward Current ◽  
Current Voltage ◽  
Current Voltage Characteristics

The effect of soft X-ray irradiation to the Schottky diode properties was analyzed in this paper. The built-in voltage, leakage current, and work function of Schottky diode were investigated. The current-voltage characteristics of the Schottky diode are measured at room temperature. After irradiation at 70 keV for 55 seconds the forward current and leakage current are increase slightly. On the other hand, the built-in voltage is decrease from the initial value about 0.12 V. Consequently, this method can cause the Schottky diode has low power consumption. The results show that soft X-ray can improve the characteristics of Schottky diode.

Room Temperature Processed Ultrahigh-Frequency Indium-Gallium–Zinc-Oxide Schottky Diode

2016 ◽  
Vol 37 (4) ◽  
pp. 389-392 ◽  
Author(s):  
Jiawei Zhang ◽  
Hanbin Wang ◽  
Joshua Wilson ◽  
Xiaochen Ma ◽  
Jidong Jin ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Schottky Diode ◽  
Room Temperature ◽  
Ultrahigh Frequency ◽  
Indium Gallium Zinc Oxide ◽  
Indium Gallium

DLTS studies of defects produced in n-type silicon by hydrogen implantation at low temperature

2002 ◽  
Vol 744 ◽  
Author(s):  
Takahide Sugiyama ◽  
Masayasu Ishiko ◽  
Shigeki Kanazawa ◽  
Yutaka Tokuda
Keyword(s):  
Activation Energy ◽  
Low Temperature ◽  
Room Temperature ◽  
Reverse Bias ◽  
Thermal Emission ◽  
Sample Temperature ◽  
Zero Bias ◽  
Type Silicon ◽  
Projected Range ◽  
Hydrogen Implantation

ABSTRACTMetastable defects are discovered in hydrogen-implanted n-type silicon. Hydrogen implantation was performed with the energy of 80 keV to a dose of 2×10 cm- at 109 K. After implantation, the sample temperature was raised to room temperature. DLTS measurements were carried out in the temperature range 80–290 K for fabricated diodes. When the sample is reverse-biased at 10V for 10 min at room temperature and then is cooled down to 80 K, three new peaks labeled EM1, EM2 and EM3 appear around 150, 190 and 240 K, respectively. The introduction of metastable defects is found to be characteristic of low temperature implantation. We have evaluated properties of EM1 in detail. EM1 with thermal emission activation energy of 0.29 eV has a peak in concentration around the depth of 0.64 μ m, which corresponds to the projected range of 80 keV hydrogen. EM1 is regenerated with the reverse bias applied around 270 K and is removed with the zero bias around 220 K.

scholarly journals Negative Differential Resistance Behavior in Delta-Doped AlInP Structure Grown by MOCVD

2002 ◽  
Vol 25 (3) ◽  
pp. 245-248
Author(s):  
K. F. Yarn
Keyword(s):  
Schottky Diode ◽  
Negative Differential Resistance ◽  
Room Temperature ◽  
Thermionic Emission ◽  
Differential Resistance ◽  
Tunneling Effect ◽  
Peak Current Density ◽  
Interband Tunneling ◽  
First Time ◽  
Peak To Valley Ratio

An AlInP delta-doped schottky diode exhibiting negative differential resistance (NDR) behavior is demonstrated for the first time. The NDR characteristics with a peak to valley ratio of 5.5 and peak current density of1KA/cm2were achieved at room temperature. In addition, the maximum available power is estimated up to5W/cm2. The mechanism for such performance is phenomenologically analyzed by the combination of resonant interband tunneling (RIT) and thermionic emission processes associated with tunneling effect on the metal-semiconductor (MS) interface.

Analysis of current–voltage and capacitance–voltage characteristics of Zr/p-Si Schottky diode with high series resistance

2020 ◽  
Vol 34 (10) ◽  
pp. 2050095
Author(s):  
Durmuş Ali Aldemir
Keyword(s):  
Barrier Height ◽  
Schottky Diode ◽  
Ideality Factor ◽  
Series Resistance ◽  
Zero Bias ◽  
Acceptor Concentration ◽  
Current Voltage ◽  
Capacitance Voltage ◽  
High Series ◽  
Contact Parameters

Zr/p-Si Schottky diode was fabricated by DC magnetic sputtering of Zr on p-Si. Zr rectifying contact gave a zero bias barrier height of 0.73 eV and an ideality factor of 1.33 by current–voltage measurement. The experimental zero bias barrier height was higher than the value predicted by metal-induced gap states (MIGSs) and electronegativity theory. The forward bias current was limited by high series resistance. The series resistance value of 9840 [Formula: see text] was determined from Cheung functions. High value of the series resistance was ascribed to low quality ohmic contact. In addition to Cheung functions, important contact parameters such as barrier height and series resistance were calculated by using modified Norde method. Re-evaluation of modified Norde functions was realized in the direction of the method proposed by Lien et al. [IEEE Trans. Electron Devices 31 (1984) 1502]. From the method, the series resistance and ideality factor values were found to be as 41.49 [Formula: see text] and 2.08, respectively. The capacitance–voltage characteristics of the diode were measured as a function of frequency. For a wide range of applied frequency, the contact parameters calculated from [Formula: see text]–[Formula: see text] curves did not exhibit frequency dependence. The barrier height value of 0.71 eV which was in close agreement with the value of zero bias barrier height was calculated from [Formula: see text]–[Formula: see text] plot at 1 MHz. The values of acceptor concentration obtained from [Formula: see text]–[Formula: see text] curves showed consistency with actual acceptor concentration of p-Si.

MILLIMETER AND SUB-MILLIMETER WAVE PERFORMANCE OF AN ERAS:INALGAAS SCHOTTKY DIODE COUPLED TO A SINGLE-TURN SQUARE SPIRAL

2007 ◽  
Vol 17 (02) ◽  
pp. 383-394 ◽  
Author(s):  
E. R. Brown ◽  
A. C. Young ◽  
J. E. Bjarnason ◽  
J. D. Zimmerman ◽  
A. C. Gossard ◽  
...  
Keyword(s):  
Plane Wave ◽  
Schottky Diode ◽  
Water Source ◽  
Hot Water ◽  
Equivalent Temperature ◽  
Spiral Antenna ◽  
Zero Bias ◽  
Single Turn ◽  
Noise Equivalent Temperature Difference ◽  
Coherent Source

We report the first experimental results for noise-equivalent power (NEP) and noise-equivalent temperature difference (NETD) of single-crystal ErAs:InAlGaAs , zero-bias rectifier diodes coupled to free space quasi-optically in the THz region. At a frequency of 639 GHz, an optical NEP of 4.0×10−12 W / Hz 1/2 is measured with the rectifier coupled to a quasi-plane-wave coherent source through a single-turn square spiral antenna. With a broadband thermal (hot water) source, an NETD of 120 mK is measured from the same device. Antenna radiation patterns at 100 GHz and 639 GHz are also presented.

MODELING THE IMPEDANCE OF NANOSTRUCTURED PV IN SIMULINK/MATLAB

2013 ◽  
Vol 27 (20) ◽  
pp. 1350139 ◽  
Author(s):  
MOHAMMAD HOUSHMAND ◽  
MOHAMMAD. H. ZANDI ◽  
NIMA E. GORJI
Keyword(s):  
Room Temperature ◽  
Cell Structure ◽  
Complex Impedance ◽  
Impedance Measurement ◽  
Nyquist Plot ◽  
Equivalent Circuits ◽  
Zero Bias ◽  
Heterojunction Solar Cells ◽  
Solar Cell Structure ◽  
First Time

Impedance measurement is a common method to study the electrical properties of thin film photovoltaics. For the first time, we use the MATLAB/Simulink environment to extract the complex impedance of the nanostructured heterojunction solar cells. The impedance magnitude, phase and Nyquist plot of the PV are simulated in LTI Viewer and Impedance versus Frequency analysis tools of SimPower GUI block of Simulink. We examined a variety of the equivalent circuits consisting of capacitance, series and shunt resistances representing the solar cell structure. The model uses the parameters with values reported in the literature at room temperature and zero bias. The effect of the additional capacitance and resistances in the equivalent circuits on the impedance components of the cells is considered by Simulink environment.

Modeling and Simulations of Pd/n-ZnO Schottky Diode and its Comparison with Measurements

2009 ◽  
Vol 79-82 ◽  
pp. 1317-1320 ◽  
Author(s):  
S Faraz ◽  
Haida Noor ◽  
M. Asghar ◽  
Magnus Willander ◽  
Qamar-ul Wahab
Keyword(s):  
Schottky Diode ◽  
Room Temperature ◽  
Depletion Region ◽  
Current Voltage ◽  
Capacitance Voltage ◽  
Current Voltage Characteristics ◽  
Recombination Current ◽  
Experimental Values ◽  
Iv Curves ◽  
The Ideal

Modeling of Pd/ZnO Schottky diode has been performed together with a set of simulations to investigate its behavior in current-voltage characteristics. The diode was first fabricated and then the simulations were performed to match the IV curves to investigate the possible defects and their states in the bandgap. The doping concentration measured by capacitance-voltage is 3.4 x 1017 cm-3. The Schottky diode is simulated at room temperature and the effective barrier height is determined from current voltage characteristics both by measurements and simulations and it was found to be 0.68eV. The ideality factor obtained from simulated results is 1.06-2.04 which indicates that the transport mechanism is thermionic. It was found that the recombination current in the depletion region is responsible for deviation of experimental values from the ideal thermionic model deployed by the simulator.

Porous Silicon Organic Vapor and Humidity Sensor

1996 ◽  
Vol 459 ◽  
Author(s):  
M. C. Poon ◽  
J.K.O. Sin ◽  
H. Wong ◽  
P. G. Han ◽  
W. H. Kwok ◽  
...  
Keyword(s):  
Porous Silicon ◽  
Response Time ◽  
Schottky Diode ◽  
Room Temperature ◽  
Humidity Sensor ◽  
Ethanol Vapor ◽  
Electrical Contacts ◽  
Diode Structure ◽  
Organic Vapor ◽  
Humidity Change

ABSTRACTThis paper presents new organic vapor sensitive device using anodized porous silicon (PS). The sensor has aluminum (Al)/PS/p-Si/Al Schottky diode structure and sensitivity at room temperature in 2600 ppm acetone, methanol, 2-propanol and ethanol is about 4, 5, 10 and 40 times respectively. The sensitivity in 800–2600 ppm ethanol vapor is 2 to 40 times. The diode sensor can be converted into an Al/PS/Al resistor sensor by switching the electrical contacts, and the sensitivity is about 500 times for a humidity change of 43–75%. All sensors have response time of about 0.5 min. The sensitivity is stable with time and the PS sensor can be integrated into VLSI Si devices to form novel microelectronic systems.

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