Development of a high vacuum 50 keV 1 Amp pulsed electron gun

Author(s):  
A.R. Chindarkar ◽  
K.C. Mittal ◽  
K.P. Dixit ◽  
V. Yadav ◽  
R.B. Chavan ◽  
...  
Keyword(s):  
1999 ◽  
Vol 5 (S2) ◽  
pp. 646-647
Author(s):  
H.W. Mook ◽  
A.H.V. van Veen ◽  
P. Kruit

The energy resolution which can be attained in electron energy loss spectroscopy (EELS) is determined by the energy spread of the electron source. The energy width of a high brightness electron gun (typically 0.4 to 0.8 eV) blurs the energy spectrum. A pre-specimen energy filter or monochromator must be used to reduce the energy width of the beam below 0.1 eV to allow detailed EELS analysis of the electronic band structures in materials. The monochromator can not only improve EELS, but it is also capable of improving the spatial resolution in low voltage SEM, which is limited by the chromatic blur of the objective lens. A new type of monochromator the Fringe Field Monochromator has been designed and experiments in an ultra high vacuum setup show the monochromatisation of a Schottky Field Emission Gun.


1997 ◽  
Vol 472 ◽  
Author(s):  
T. Braisaz ◽  
P. Ruterana ◽  
G. Nouet ◽  
Ph. Komninou ◽  
Th. Kehagias ◽  
...  

ABSTRACTHigh resolution electron microscopy has been used to characterize the structure of ultra thin films of titanium deposited on KBr substrate by Ultra High Vacuum (UHV) electron-gun evaporation. The size of the grains has an order of magnitude of 10 nm whatever the substrate temperature. The observations have been carried out along <1123> zone axis. Some of the grains contain planar defects which were identified as the twin {1011}. The atomic structure of this twin is characterized by a mirror plane similar to that observed in polycrystalline titanium. Additionaly, this structure can be modified by a b2/2 twinning dislocation.


2016 ◽  
Vol 35 (6) ◽  
pp. 621-627 ◽  
Author(s):  
M. Sankar ◽  
K.V. Mirji ◽  
V.V. Satya Prasad ◽  
R.G. Baligidad ◽  
A.A. Gokhale

AbstractPure niobium metal, produced by alumino-thermic reduction of niobium oxide, contains various impurities which need to be reduced to acceptable levels to obtain aerospace grade purity. In the present work, an attempt has been made to refine niobium metals by electron beam drip melting technique to achieve purity confirming to the ASTM standard. Input power to the electron gun and melt rate were varied to observe their combined effect on extend of refining and loss of niobium. Electron beam (EB) melting is shown to reduce alkali metals, trace elements and interstitial impurities well below the specified limits. The reduction in the impurities during EB melting is attributed to evaporation and degassing due to the combined effect of high vacuum and high melt surface temperature. The % removal of interstitial impurities is essentially a function of melt rate and input power. As the melt rate decreases or input power increases, the impurity levels in the solidified niobium ingot decrease. The EB refining process is also accompanied by considerable amount of niobium loss, which is attributed to evaporation of pure niobium and niobium sub-oxide. Like other impurities, Nb loss increases with decreasing melt rate or increase in input power.


Author(s):  
W. R. Bottoms

The vacuum system of any electron optical instrument effects the contamination rate, electron source life, the quality of the electron source which can be employed, vibration amplitudes and stray magnetic field levels. It is particularly important for the scanning electron microscope where the object of primary interest is a specimen surface which can be altered by contamination. If we extend our investigations to employ Auger electron spectroscopy for surface chemical analysis, the requirements on the vacuum system are much more stringent. It is necessary that the chemical composition of the surface monolayer is not appreciably altered during the time required to take Auger spectra. The vacuum level required to accomplish this is dependent on the specimen material and the chemical composition of the ambient gas.Commercially available equipment can be modified to provide a vacuum environment maximizing the analytical capabilities of the instrument. The gas loads from the specimen and electron gun chambers of the instrument are minimized by utilizing only materials with favorable outgassing rates, and employing a gentle bakeout to remove water and other loosely bound gases on the system surfaces.


Author(s):  
S. Katagiri ◽  
H. Akahori ◽  
S. Ueno ◽  
A. Iwama

1.Electron gun - A new high voltage cable and porcelain insulator has been developed. A successful study of superior surface treatment of the insulator and improved means of sealing the cable resulted in eliminating surface discharge of the insulator. Since an electrode discharge and surface discharge of an insulator cannot be completely eliminated in a vacuum of the order of 10-5 to 10-6 torr, an high capacity vacuum system is employed to assure high vacuum and a discharge free system. Further, small quantities of inert gases such as N2, Ar, He etc. is introduced into the gun chamber to maintain a vacuum of 1 to 2 x 10-4 torr.2.Evacuating system.At 200KV it is necessary in a single stage electron gun to provide greater insulating distance to inhibit discharges. Consequently, the electron gun chamber is inevitably larger. The gun chamber volume of this electron microscope is 32 liter. A 4″ diameter single manifold and 1200 liter/sec. oil diffusion pump comprise the evacuating system.


Author(s):  
T. Tomita ◽  
S. Katoh ◽  
H. Kitajima ◽  
Y. Kokubo ◽  
Y. Ishida

It is well known that the combination of a field emission gun (FEG) and a conventional transmission electron microscope (CTEM) is extremely important for nanometer area analysis in analytical electron microscopy. However, the smaller illumination angle and reduced energy spread of FEG than those of a conventional electron gun (W hair pin filament or LaB6) give a slowly damping envelop function in phase contrast transfer function (PCTF). Thus the FEG ensures application not only to analytical microscopy but also to high resolution electron microscopy to improve the information limit.In a high voltage electron microscope (above 200 kV), high-speed vacuum pumps have to be provided below the acceleration tube to get an ultra high vacuum (UHV) around the field emission tip located at the top of the acceleration tube. However, this method is not always the best way to provide UHV because of the poor vacuum conductance caused by the electrodes inside the acceleration tube.


1987 ◽  
Vol 5 (1) ◽  
pp. 92-97 ◽  
Author(s):  
Hisao Watanabe ◽  
Nagamitsu Yoshimura ◽  
Shoji Katoh ◽  
Nobuyuki Kobayashi
Keyword(s):  

1994 ◽  
Vol 299 ◽  
Author(s):  
C. K. Chung ◽  
J. Hwang

AbstractHeteroepitaxial Ir-silicide/SiGe layers on the top of p-Si(100) have been achieved at a substrate temperature of 450 °C. The co-deposited Ir-silicide layer was determined to be Ir3Si4 with four types of epitaxial modes. Thermal stability of the film was examined by using Auger electron spectroscopy and X-ray diffractometer. The Ir3Si4/SiGe layers were stable as annealed at 550 °C for 20 sec in a rapid thermal annealing furnace, while interdiffusion between Ir3Si4 and SiGe occurs at a temperature of 750 deg;C or higher for 20 sec. The traditional guard-ring fabrication process should be performed before epitaxial films deposition due to this thermal instability.


2007 ◽  
Vol 14 (03) ◽  
pp. 357-360
Author(s):  
SZYMON WINIARZ ◽  
PIOTR BISKUPSKI ◽  
STANISLAW SZUBA ◽  
SLAWOMIR MIELCAREK ◽  
RYSZARD CZAJKA

Bi 2 Te 3 has attracted attention due to its potential applications in the microfabrication of integrated thermoelectric devices. It is also interesting to study the metallization process of this compound. Metallic nanostructures were deposited by means of an electron gun evaporator in ultra high vacuum (UHV) conditions (10-8 Pa) on the freshly cleaved 0001 surface of the crystal Bi 2 Te 3. Measurements were conducted using the commercially available Omicron UHV scanning tunneling microscope (STM). Scanning tunneling spectroscopy (STS) measurements were performed using current imaging tunneling spectroscopy (CITS), and subsequent calculation of the dI/dV maps. Metallic characteristics were observed on nickel islands since early stages of the growth. CITS and dI/dV maps showed distinct contrast between the substrate and metallic islands. Similar contrast was not observed in the case of titanium, most probably due to an intercalation process. Occurring of such a process was confirmed by the appearance of the superlattice structure.


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