Electron Transport Properties of WS2 Field-Effect Transistors Modulated by Electron Beam Irradiation Under Gate Voltage

2019 ◽  
Vol 40 (9) ◽  
pp. 1542-1545
Author(s):  
Jieyuan Liang ◽  
Lijie Zhang ◽  
Xiaoxiao Li ◽  
Baojun Pan ◽  
Tingyan Luo ◽  
...  
2020 ◽  
Vol 10 (17) ◽  
pp. 5840
Author(s):  
Antonio Di Bartolomeo ◽  
Aniello Pelella ◽  
Alessandro Grillo ◽  
Francesca Urban ◽  
Filippo Giubileo

In this study, we investigate the electrical transport properties of back-gated field-effect transistors in which the channel is realized with two-dimensional transition metal dichalcogenide nanosheets, namely palladium diselenide (PdSe2) and molybdenum disulfide (MoS2). The effects of the environment (pressure, gas type, electron beam irradiation) on the electrical properties are the subject of an intense experimental study that evidences how PdSe2-based devices can be reversibly tuned from a predominantly n-type conduction (under high vacuum) to a p-type conduction (at atmospheric pressure) by simply modifying the pressure. Similarly, we report that, in MoS2-based devices, the transport properties are affected by pressure and gas type. In particular, the observed hysteresis in the transfer characteristics is explained in terms of gas absorption on the MoS2 surface due to the presence of a large number of defects. Moreover, we demonstrate the monotonic (increasing) dependence of the width of the hysteresis on decreasing the gas adsorption energy. We also report the effects of electron beam irradiation on the transport properties of two-dimensional field-effect transistors, showing that low fluences of the order of few e-/nm2 are sufficient to cause appreciable modifications to the transport characteristics. Finally, we profit from our experimental setup, realized inside a scanning electron microscope and equipped with piezo-driven nanoprobes, to perform a field emission characterization of PdSe2 and MoS2 nanosheets at cathode–anode separation distances as small as 200 nm.


2020 ◽  
Vol 4 (1) ◽  
pp. 25
Author(s):  
Aniello Pelella ◽  
Alessandro Grillo ◽  
Enver Faella ◽  
Filippo Giubileo ◽  
Francesca Urban ◽  
...  

In this work, monolayer molybdenum disulfide (MoS2) nanosheets, obtained via chemical vapor deposition onto SiO2/Si substrates, are exploited to fabricate field-effect transistors with n-type conduction, high on/off ratio, steep subthreshold slope and good mobility. We study their electric characteristics from 10−6 Torr to atmospheric air pressure. We show that the threshold voltage of the transistor increases with the growing pressure. Moreover, Schottky metal contacts in monolayer molybdenum disulfide (MoS2) field-effect transistors (FETs) are investigated under electron beam irradiation conditions. It is shown that the exposure of Ti/Au source/drain electrodes to an electron beam reduces the contact resistance and improves the transistor performance. It is shown that e-beam irradiation lowers the Schottky barrier at the contacts due to thermally induced atom diffusion and interfacial reactions. The study demonstrates that electron beam irradiation can be effectively used for contact improvement though local annealing. It is also demonstrated that the application of an external field by a metallic nanotip induces a field emission current, which can be modulated by the voltage applied to the Si substrate back-gate. Such a finding, that we attribute to gate-bias lowering of the MoS2 electron affinity, enables a new field-effect transistor based on field emission.


2010 ◽  
Vol 49 (4) ◽  
pp. 04DN12 ◽  
Author(s):  
Tatsuya Doi ◽  
Kyouhei Koyama ◽  
Yasuto Chiba ◽  
Hajime Tsuji ◽  
Misaki Ueno ◽  
...  

2021 ◽  
Author(s):  
Antonio Di Bartolomeo ◽  
Alessandro Grillo ◽  
Aniello Pelella ◽  
Enver Faella ◽  
Maurizio Passacantando ◽  
...  

2018 ◽  
Vol 72 (10) ◽  
pp. 1203-1208 ◽  
Author(s):  
Barbara Yuri Choi ◽  
Kyungjune Cho ◽  
Jinsu Pak ◽  
Tae-Young Kim ◽  
Jae-Keun Kim ◽  
...  

2018 ◽  
Vol 20 (14) ◽  
pp. 9038-9044 ◽  
Author(s):  
Ming-Yen Lu ◽  
Shang-Chi Wu ◽  
Hsiang-Chen Wang ◽  
Ming-Pei Lu

The mechanisms of threshold voltage shift evolution of MoS2 FETs after electron beam irradiation were demonstrated experimentally for the first time.


2000 ◽  
Vol 639 ◽  
Author(s):  
Narihiko Maeda ◽  
Tadashi Saitoh ◽  
Kotaro Tsubaki ◽  
Toshio Nishida ◽  
Naoki Kobayashi

Electron transport properties in the Al0.15Ga0.85N/GaN heterostructure field effect transistors (HFETs) have been examined from room temperature up to 400°C. The temperature dependencies of the two-dimensional electron gas (2DEG) mobility have been systematically measured for the samples with different 2DEG densities. The 2DEG mobility has decreased with increasing the temperature, however, its decrease ratio has been no longer large above 300°C. Moreover, the 2DEG mobility has found to be less dependent on the 2DEG density at higher temperatures. These observed features indicate that the 2DEG mobility above room temperature is limited by longitudinal optical (LO) phonon scattering, as is expected by theoretical prediction. The observed 2DEG mobilities at 400°C were as high as from 100 to 120 cm2/Vs, directly providing the evidence for suitability of the HFET of this material system for high-temperature applications. The temperature dependence of the transconductance (gm) of a HFET device has also been examined up to 400°C. It has been revealed that the temperature dependence of gm has basically the same features as those of the 2DEG mobility in the corresponding temperature region.


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