Recent Progress In In Situ Electron-beam Lithography Of GaAs

2005 ◽  
Author(s):  
Y. Sugimoto ◽  
K. Akita ◽  
H. Kawanishi
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Recent Progress

scholarly journals Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice

Nano Letters ◽  
2018 ◽  
Vol 18 (8) ◽  
pp. 5036-5041 ◽  
Author(s):  
Yu Hong ◽  
Ding Zhao ◽  
Dongli Liu ◽  
Binze Ma ◽  
Guangnan Yao ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Water Ice

scholarly journals Advanced in-situ electron-beam lithography for deterministic nanophotonic device processing

2015 ◽  
Vol 86 (7) ◽  
pp. 073903 ◽  
Author(s):  
Arsenty Kaganskiy ◽  
Manuel Gschrey ◽  
Alexander Schlehahn ◽  
Ronny Schmidt ◽  
Jan-Hindrik Schulze ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Device Processing ◽  
Nanophotonic Device

In situ patterning of organic molecules in aqueous solutions using an inverted electron-beam lithography system

2016 ◽  
Vol 55 (6S1) ◽  
pp. 06GL07 ◽  
Author(s):  
Hiroki Miyazako ◽  
Kazuhiko Ishihara ◽  
Kunihiko Mabuchi ◽  
Takayuki Hoshino
Keyword(s):  
Electron Beam ◽  
Aqueous Solutions ◽  
Electron Beam Lithography ◽  
Organic Molecules ◽  
Lithography System

Fabrication of quantum wires on GaAs substrates patterned by in situ electron-beam lithography

1996 ◽  
Vol 40 (1-8) ◽  
pp. 627-631 ◽  
Author(s):  
M López ◽  
N Tanaka ◽  
I Matsuyama ◽  
T Ishikawa
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Quantum Wires ◽  
Gaas Substrates

Transport in Thermal Dip Pen Nanolithography

2004 ◽  
Author(s):  
Brent A. Nelson ◽  
Tanya L. Wright ◽  
William P. King ◽  
Paul E. Sheehan ◽  
Lloyd J. Whitman
Keyword(s):  
Electron Beam ◽  
Atomic Force Microscope ◽  
Electron Beam Lithography ◽  
Room Temperature ◽  
Optical Lithography ◽  
Ambient Conditions ◽  
Atomic Force ◽  
Resolution Limits ◽  
Dip Pen Nanolithography

The manufacture of nanoscale devices is at present constrained by the resolution limits of optical lithography and the high cost of electron beam lithography. Furthermore, traditional silicon fabrication techniques are quite limited in materials compatibility and are not well-suited for the manufacture of organic and biological devices. One nanomanufacturing technique that could overcome these drawbacks is dip pen nanolithography (DPN), in which a chemical-coated atomic force microscope (AFM) tip deposits molecular ‘inks’ onto a substrate [1]. DPN has shown resolution as good as 5 nm [2] and has been performed with a large number of molecules, but has limitations. For molecules to ink the surface they must be mobile at room temperature, limiting the inks that can be used, and since the inks must be mobile in ambient conditions, there is no way to stop the deposition while the tip is in contact with the substrate. In-situ imaging of deposited molecules therefore causes contamination of the deposited features.

scholarly journals Integrating nanotubes into microsystems with electron beam lithography and in situ catalytically activated growth

2006 ◽  
Vol 203 (6) ◽  
pp. 1094-1099 ◽  
Author(s):  
K. Gjerde ◽  
M. F. Mora ◽  
J. Kjelstrup-Hansen ◽  
T. Schurmann ◽  
L. Gammelgaard ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography
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