On-Wafer Capacitance Measurement of Nb-Based SIS Junctions With a 4-K Probe Station

2017 ◽  
Vol 27 (4) ◽  
pp. 1-4 ◽  
Author(s):  
Takafumi Kojima ◽  
Matthias Kroug ◽  
Konomi Sato ◽  
Takeshi Sakai ◽  
Yoshinori Uzawa
2014 ◽  
Vol E97.C (11) ◽  
pp. 1117-1123 ◽  
Author(s):  
Katsuhiro TSUJI ◽  
Kazuo TERADA ◽  
Ryota KIKUCHI

2021 ◽  
Vol 11 (2) ◽  
pp. 22
Author(s):  
Umberto Ferlito ◽  
Alfio Dario Grasso ◽  
Michele Vaiana ◽  
Giuseppe Bruno

Charge-Based Capacitance Measurement (CBCM) technique is a simple but effective technique for measuring capacitance values down to the attofarad level. However, when adopted for fully on-chip implementation, this technique suffers output offset caused by mismatches and process variations. This paper introduces a novel method that compensates the offset of a fully integrated differential CBCM electronic front-end. After a detailed theoretical analysis of the differential CBCM topology, we present and discuss a modified architecture that compensates mismatches and increases robustness against mismatches and process variations. The proposed circuit has been simulated using a standard 130-nm technology and shows a sensitivity of 1.3 mV/aF and a 20× reduction of the standard deviation of the differential output voltage as compared to the traditional solution.


2007 ◽  
Vol 17 (2) ◽  
pp. 343-346 ◽  
Author(s):  
A. Karpov ◽  
D. Miller ◽  
F. Rice ◽  
J.A. Stern ◽  
B. Bumble ◽  
...  
Keyword(s):  

1997 ◽  
Vol 11 (22) ◽  
pp. 2593-2619 ◽  
Author(s):  
Sadao Takaoka ◽  
Kenichi Oto ◽  
Kazuo Murase

The quantum Hall effect for the GaAs/AlGaAs heterostrcture is investigated by an ac capacitance measurement between the two-dimensional electron system (2DES) and the gate on GaAs/AlGaAs. The capacitance minima at the quantum Hall plateaus are mainly determined not by the 2DES area under the gate but by the edge length of 2DES. There exists the high conductive region due to the edge states along the 2DES boundary, when the bulk conductivity σxx is small enough at low temperatures and high magnetic fields. From the temperature and frequency dependence of the capacitance minima, it is found that the measured capacitance consists of the contribution from the edge states and that of the bulk state, which is treated as a distributed circuit of a resistive plate with the conductivity σxx. The evaluated width of edge states from the capacitance is much larger than the magnetic length and the cyclotron radius expected from the one-electron picture. This wide width of edge states can be explained by the compressible-incompressible strip model, in which the screening effect is taken into account. Further the bulk conductivity of less than 10-12 S (S=1/Ω) is measured by the capacitance of the Corbino geometry sample, where the edge states are absent and the capacitance is determined by only σxx in this geometry. The localization of the bulk state is investigated by the obtained σxx.


2015 ◽  
Vol 86 (8) ◽  
pp. 085109
Author(s):  
Yichun Wu ◽  
Lingzhi Wang ◽  
Yuanfeng Cai ◽  
Cunqiao Wu

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