Novel damage-free high-k removal for sub-32nm metal gate/high-k LSTP CMOSFETs using neutral beam-assisted atomic layer etching

2011 ◽  
Author(s):  
C. Y. Kang ◽  
C. Park ◽  
B. J. Park ◽  
K. S. Min ◽  
G. Y. Yeom ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Neutral Beam ◽  
Metal Gate ◽  
High K ◽  
Atomic Layer Etching

Vertical Sandwich GAA FETs With Self-Aligned High-k Metal Gate Made by Quasi Atomic Layer Etching Process

2021 ◽  
pp. 1-7
Author(s):  
Yongkui Zhang ◽  
Xuezheng Ai ◽  
Xiaogen Yin ◽  
Huilong Zhu ◽  
H. Yang ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Etching Process ◽  
Metal Gate ◽  
High K ◽  
Atomic Layer Etching

Understanding time-resolved processes in atomic-layer etching of ultra-thin Al2O3 film using BCl3 and Ar neutral beam

2014 ◽  
Vol 105 (9) ◽  
pp. 093104 ◽  
Author(s):  
Young I. Jhon ◽  
Kyung S. Min ◽  
G. Y. Yeom ◽  
Young Min Jhon
Keyword(s):  
Atomic Layer ◽  
Neutral Beam ◽  
Al2o3 Film ◽  
Time Resolved ◽  
Atomic Layer Etching

Atomic Layer Deposition of Zirconium-Based High-k Metal Gate Oxide: Effect of Si Containing Zr Precursor

2015 ◽  
Vol 15 (1) ◽  
pp. 382-385
Author(s):  
Jun Hee Cho ◽  
Sang-Ick Lee ◽  
Jong Hyun Kim ◽  
Sang Jun Yim ◽  
Hyung Soo Shin ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gate Oxide ◽  
Metal Gate ◽  
Layer Deposition ◽  
High K

Atomic layer-deposited platinum in high-k/metal gate stacks

2009 ◽  
Vol 24 (12) ◽  
pp. 125013 ◽  
Author(s):  
Christoph Henkel ◽  
Stephan Abermann ◽  
Ole Bethge ◽  
Emmerich Bertagnolli
Keyword(s):  
Atomic Layer ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K

Atomic layer etching of InP using a low angle forward reflected Ne neutral beam

2006 ◽  
Vol 89 (4) ◽  
pp. 043109 ◽  
Author(s):  
S. D. Park ◽  
C. K. Oh ◽  
J. W. Bae ◽  
G. Y. Yeom ◽  
T. W. Kim ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Neutral Beam ◽  
Atomic Layer Etching
Sign in / Sign up

Export Citation Format

Share Document