Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics

2008 ◽  
Vol 26 (5) ◽  
pp. 1258-1266 ◽  
Author(s):  
Qi Min Wang ◽  
Kwang Ho Kim
Keyword(s):  
Bias Voltage ◽  
Film Growth ◽  
Growth Characteristics ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Arc Ion Plating ◽  
Ion Plating

The Effects of Substrate Negative Bias Voltage on Morphology and Properties Base on Multi-Arc Ion Plating

2012 ◽  
Vol 217-219 ◽  
pp. 1235-1238
Author(s):  
Long Lu ◽  
Guang Guang Feng
Keyword(s):  
Bias Voltage ◽  
Bonding Strength ◽  
Steel Substrate ◽  
Negative Bias ◽  
Bias Parameter ◽  
Micro Hardness ◽  
Negative Bias Voltage ◽  
Ion Plating ◽  
Optimal Value ◽  
40Cr Steel

40Cr steel substrate was coated with Ti0.33Al0.67N films by Multi-arc ion technology. Analyses of substrate negative bias voltage on morphology thickness of the film, bonding strength and micro hardness and other properties. The substrate negative bias parameter designs within the scope of the existence of an optimal value, in order to get the optimal performance of the film.

Effect of bias voltage on the oxidation resistance of NiCoCrAlYTa coatings prepared by arc ion plating

2019 ◽  
Vol 147 ◽  
pp. 330-341 ◽  
Author(s):  
Shiming Xie ◽  
Mingjiang Dai ◽  
Songsheng Lin ◽  
Qian Shi ◽  
Chen Song ◽  
...  
Keyword(s):  
Oxidation Resistance ◽  
Bias Voltage ◽  
Arc Ion Plating ◽  
Ion Plating

Zirconia Coatings Deposited by Inductively Coupled Plasma Assisted CVD

1998 ◽  
Vol 555 ◽  
Author(s):  
P. Colpo ◽  
G. Ceccone ◽  
B. Leclercq ◽  
P. Salvatore ◽  
F. Rossi
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Inductively Coupled Plasma ◽  
Gas Mixture ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Inductively Coupled ◽  
Deposition Parameters ◽  
Coating Characteristics ◽  
Dc Bias

AbstractThin films of zirconia have been deposited by an Inductively Coupled Plasma Assisted CVD (ICP-PACVD) reactor from tetra (tert-butoxy)-zircon precursor diluted in Ar and O2 gas mixture. An independent RF generator is used to control carefully the substrate negative bias voltage during the deposition. Zirconia thin films, with thickness up to 10 microns were deposited on Si (100) polished wafers under different plasma conditions. Correlation between deposition parameters, and microstructure has been established showing that the ion bombardment has a large influence on the coating characteristics. In particular, the possibility of tailoring mechanical properties of the films by controlling the applied DC bias voltage is discussed.

The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films

2008 ◽  
Vol 202 (12) ◽  
pp. 2684-2689 ◽  
Author(s):  
Guangan Zhang ◽  
Pengxun Yan ◽  
Peng Wang ◽  
Youming Chen ◽  
Junying Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Negative Bias ◽  
Structure And Properties ◽  
Negative Bias Voltage
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