The Effects of Substrate Negative Bias Voltage on Morphology and Properties Base on Multi-Arc Ion Plating

2012 ◽  
Vol 217-219 ◽  
pp. 1235-1238
Author(s):  
Long Lu ◽  
Guang Guang Feng
Keyword(s):  
Bias Voltage ◽  
Bonding Strength ◽  
Steel Substrate ◽  
Negative Bias ◽  
Bias Parameter ◽  
Micro Hardness ◽  
Negative Bias Voltage ◽  
Ion Plating ◽  
Optimal Value ◽  
40Cr Steel

40Cr steel substrate was coated with Ti0.33Al0.67N films by Multi-arc ion technology. Analyses of substrate negative bias voltage on morphology thickness of the film, bonding strength and micro hardness and other properties. The substrate negative bias parameter designs within the scope of the existence of an optimal value, in order to get the optimal performance of the film.

Effects of Negative Bias Voltage on Structure and Mechanical Properties of DLC Films Synthesized by FCVA Deposition

2011 ◽  
Vol 287-290 ◽  
pp. 2203-2206 ◽  
Author(s):  
Feng Wen ◽  
N. Huang ◽  
F.J. Jing ◽  
H. Sun ◽  
Y. Cao
Keyword(s):  
Mechanical Properties ◽  
Bias Voltage ◽  
Photoelectron Spectroscopy ◽  
Vacuum Arc ◽  
Negative Bias ◽  
Micro Hardness ◽  
Negative Bias Voltage ◽  
X Ray ◽  
Composition And Structure ◽  
Pin On Disc

Diamond-like carbon (DLC) films have been given great attention in the last twenty years and applied in many fields due to its super mechanical property. In this paper, DLC films were prepared by filter cathodic vacuum arc (FCVA) deposition under different negative bias voltage. No spalling was found in all of as-prepared DLC films. X-ray photoelectron spectroscopy (XPS), Raman spectra were employed to analyze composition and structure, the results showed that as-prepared DLC films had tendency of graphite with increase of negative bias voltage. Mechanical properties were characterized by micro-hardness and pin-on disc tests, the results showed that the hardness of DLC films decreased with bias voltage, but still kept good wear resistant.

Effects of Technical Elements on Microstructure and Hardness of TiAlN/TiN Coatings

2011 ◽  
Vol 86 ◽  
pp. 407-410
Author(s):  
Long Lu ◽  
Ming Hao Ren ◽  
Tao Jiang
Keyword(s):  
Steel Substrate ◽  
Negative Bias ◽  
Micro Hardness ◽  
Marked Influence ◽  
Tin Films ◽  
Tin Coatings ◽  
40Cr Steel

40Cr steel substrate was coated with TiAlN/TiN films by multi-arc ion technology. The effect of technical elements on the surface and micro hardness of TiAlN/TiN films had been studied with metallographic microscope, SEM and micro hardness instrument. The results show that the negative bias and the target current have marked influence in performance of TiAlN/TiN films. The content of Ti and Al in films becomes lower and lower when the negative bias becomes higher and higher. The content of Ti/Al of films increases when the target current increases. The micro hardness increases firstly and then drops with the increase of negative bias or the target current.

Study on Arc Ion Plating Nitride Films of Microscopic Morphology and Micro-Hardness

2011 ◽  
Vol 306-307 ◽  
pp. 274-279
Author(s):  
Qing Tao ◽  
Yan Wei Sui ◽  
Sun Zhi ◽  
Wei Song
Keyword(s):  
Thin Films ◽  
Steel Substrate ◽  
Nitride Film ◽  
Composition Analysis ◽  
Micro Hardness ◽  
Arc Ion Plating ◽  
Ion Plating ◽  
Tin Thin Films ◽  
Research Procedure ◽  
Microscopic Morphology

AlN and TiN thin films are widely used in electronic devices and acoustic material and other fields because of its unique merit, the preparation of nitride thin films by using the arc ion plating has not been a systematic and deep study. The article presents our research procedure which the AlN and TiN thin films are deposited on stainless steel substrate by arc ion plating (AIP). The characteristics of thin films, for example microstructure, morphology, composition analysis and hardness, are examined and analyzed. The results showed that: Droplet-like particles appear in the microstructure of nitride thin films, and the grain size of droplet-like particles in AlN thin films is greater than in TiN thin films. The micro-hardness of nitride films preparation in experiment has improved significantly, and establish firmly basic for extending the application field of nitride film.

Zirconia Coatings Deposited by Inductively Coupled Plasma Assisted CVD

1998 ◽  
Vol 555 ◽  
Author(s):  
P. Colpo ◽  
G. Ceccone ◽  
B. Leclercq ◽  
P. Salvatore ◽  
F. Rossi
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Inductively Coupled Plasma ◽  
Gas Mixture ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Inductively Coupled ◽  
Deposition Parameters ◽  
Coating Characteristics ◽  
Dc Bias

AbstractThin films of zirconia have been deposited by an Inductively Coupled Plasma Assisted CVD (ICP-PACVD) reactor from tetra (tert-butoxy)-zircon precursor diluted in Ar and O2 gas mixture. An independent RF generator is used to control carefully the substrate negative bias voltage during the deposition. Zirconia thin films, with thickness up to 10 microns were deposited on Si (100) polished wafers under different plasma conditions. Correlation between deposition parameters, and microstructure has been established showing that the ion bombardment has a large influence on the coating characteristics. In particular, the possibility of tailoring mechanical properties of the films by controlling the applied DC bias voltage is discussed.

The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films

2008 ◽  
Vol 202 (12) ◽  
pp. 2684-2689 ◽  
Author(s):  
Guangan Zhang ◽  
Pengxun Yan ◽  
Peng Wang ◽  
Youming Chen ◽  
Junying Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Negative Bias ◽  
Structure And Properties ◽  
Negative Bias Voltage
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