Formation of Si–SiO2 stacked-gate structures by plasma-assisted and rapid-thermal processing: Improved device performance through process integration
1994 ◽
Vol 12
(4)
◽
pp. 2839
◽
Keyword(s):
Keyword(s):
1997 ◽
Vol 26
(12)
◽
pp. 1422-1427
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2011 ◽
Vol 131
(2)
◽
pp. 159-165
◽
2019 ◽
Vol 8
(1)
◽
pp. P35-P40
◽
Keyword(s):
1994 ◽
Vol 141
(11)
◽
pp. 3200-3209
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1990 ◽
Vol 29
(Part 2, No. 1)
◽
pp. L137-L140
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