Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modeling
1994 ◽
Vol 12
(6)
◽
pp. 3118
◽
Keyword(s):
Ion Flux
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Two-dimensional modeling of high plasma density inductively coupled sources for materials processing
1994 ◽
Vol 12
(1)
◽
pp. 461
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Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
1996 ◽
Vol 24
(1)
◽
pp. 129-130
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Keyword(s):
2002 ◽
Vol 20
(2)
◽
pp. 325-334
◽
2006 ◽
Vol 77
(3)
◽
pp. 03B901
◽
Keyword(s):
2011 ◽
Vol 39
(11)
◽
pp. 2536-2537
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Keyword(s):